Unlock instant, AI-driven research and patent intelligence for your innovation.

Auxiliary exposure device for multi-beam interference lithography

A multi-beam interference and exposure device technology, which is applied in the direction of microlithography exposure equipment, photolithography exposure device, etc., can solve the problems of affecting the experimental results, restricting the use, polluting the surface of the substrate, etc., and achieves the effect of precise control

Inactive Publication Date: 2017-03-08
XIAN TECH UNIV
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although this control method can meet the most basic experimental needs, the substrate may be damaged by clamping the substrate with a dry plate frame, and the coincidence of the exposure position cannot be ensured during multiple exposures, and the substrate is extremely exposed to multiple exposures. It is easy to contaminate the surface of the substrate and affect the experimental results
The workpiece stage of the existing stepper lithography machine can accurately position the substrate by using precise measurement and control technology, but its high price limits its use in ordinary interference lithography experiments

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Auxiliary exposure device for multi-beam interference lithography
  • Auxiliary exposure device for multi-beam interference lithography
  • Auxiliary exposure device for multi-beam interference lithography

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] An embodiment of the present invention provides an auxiliary exposure device for multi-beam interference lithography, such as figure 1 As shown, the device consists of a base 1, an aperture adsorption base 2, an auxiliary exposure aperture 3 and the opening 4 on it, a substrate rotating table 9 and the first reading pointer 5 on it, the first locking screw 6, The substrate suction cup 7, the air extraction hole 8, the rotary table locking screw 10, and the aperture adsorption base locking screw 11 are composed; the substrate rotary table 9 has a substrate suction cup 7, and the suction cup center has an air extraction hole 8 for the substrate. Absorbed and fixed, it is convenient to take and place the substrate, and can avoid substrate clamping damage; the base 1 is a one-dimensional translation guide rail, and the substrate rotating table 9 moves on the one-dimensional translation guide rail, and is adsorbed on the substrate The position of the substrate on the surface...

Embodiment 2

[0021] The embodiment of the present invention also provides a multi-beam interference lithography auxiliary exposure device, such as figure 2 As shown, the device includes a base 1, an auxiliary exposure diaphragm 3 with an opening 4 located at the edge, a diaphragm adsorption base 2 with a rotating function, a third reading pointer 14 and a second locking screw 15 on it, and the rest are the same Example 1; the base 1 includes a lifting platform 12 and a two-dimensional translation guide rail 13, the side of the lower platform of the lifting platform 12 is vertically provided with a scale column 17, and the side of the upper platform of the lifting platform 12 is horizontally provided with The second reading pointer 16, the two-dimensional translation guide rail 13 is arranged on the upper platform of the lifting platform 12, and the two-dimensional translation guide rail 13 is located under the aperture adsorption base 2 and the substrate rotation table 9; The combination ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a multi-beam interference photoetching auxiliary exposure device which comprises a base, a diaphragm adsorbing base, an auxiliary exposure diaphragm and a substrate rotation table. The diaphragm adsorbing base and the substrate rotation table are arranged on the base. The auxiliary exposure diaphragm is arranged on the diaphragm adsorbing base, and an open hole is formed in the auxiliary exposure diaphragm. The substrate rotating table is provided with a first reading pointer, and the side face, close to the diaphragm adsorbing base, of the substrate is provided with a substrate sucker, and an air sucking hole is formed in the center of the substrate sucker. The multi-beam interference photoetching auxiliary exposure device is simple and reasonable in structure, a substrate is convenient to install and adjust, single or multiple times of exposure in different positions of the substrate can be achieved, the coincidence degree of multiple times of exposure is improved, the substrate does not need to be touched during adjustment, the contamination probability of the substrate is reduced, the auxiliary exposure diaphragm is convenient to replace, and the multi-beam interference photoetching auxiliary exposure device is suitable for difference demands.

Description

technical field [0001] The invention belongs to the technical field of multi-beam interference lithography exposure, and in particular relates to an auxiliary exposure device for multi-beam interference lithography. Background technique [0002] At present, in the process of multi-beam interference lithography exposure experiment, a dry plate frame is generally used to hold the substrate, and the substrate is manually pushed and rotated to change the exposure position or perform multiple exposures at the same position. Although this control method can meet the most basic experimental needs, the substrate may be damaged by clamping the substrate with a dry plate frame, and the coincidence of the exposure position cannot be ensured during multiple exposures, and the substrate is extremely exposed to multiple exposures. It is easy to contaminate the surface of the substrate and affect the experimental results. The workpiece stage of the existing stepper lithography machine can...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
Inventor 张锦马丽娜蒋世磊孙国斌杭凌侠弥谦
Owner XIAN TECH UNIV