Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Four-axis jet polishing machine

A technology of polishing machine and jet flow, which is applied in the field of polishing machine, can solve the problems of high cost, complicated control, poor machining accuracy, etc., and achieve the effect of low cost, simple overall structure and stable jet flow

Inactive Publication Date: 2015-11-11
BEIJING FORESTRY UNIVERSITY
View PDF6 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The application of jet polishing machines is becoming more and more extensive, but the existing jet polishing machines generally have high cost, poor processing accuracy and complicated control

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Four-axis jet polishing machine
  • Four-axis jet polishing machine
  • Four-axis jet polishing machine

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] In order to facilitate the understanding of the present invention, the present invention will be described more fully below with reference to the associated drawings. Preferred embodiments of the invention are shown in the accompanying drawings. However, the present invention can be embodied in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided for the purpose of making the disclosure of the present invention more thorough and comprehensive.

[0025] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the technical field of the invention. The terms used herein in the description of the present invention are for the purpose of describing specific embodiments only, and are not intended to limit the present invention.

[0026] refer to figure 1 As shown, a kind of four-axis jet polishing machine provided by the pr...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to the technical field of polishing machines and discloses a four-axis jet polishing machine. The four-axis jet polishing machine comprises a solution storage tank, a diaphragm pump, a pipeline, a nozzle buffer pipe, a nozzle and a collection box. The solution storage tank contains jet solutions. The collection box is arranged above the solution storage tank. Workpieces are arranged inside the collection box and correspond to an inlet position of the collection box. An outlet of the collection box is communicated with the solution storage tank. The diaphragm pump is also communicated with the solution storage tank and connected with one end of the pipeline. The other end of the pipeline is connected with the nozzle buffer pipe. The nozzle is arranged at one end of the nozzle buffer pipe and located above the inlet of the collection box. The collection box can move in the X-axis direction; the nozzle buffer pipe can move in the Y-axis and Z-axis directions and rotate. The four-axis jet polishing machine is simple in overall structure, low in cost, stable in spraying jet and good in removal effect.

Description

technical field [0001] The present invention relates to the technical field of polishing machines, and more specifically relates to a four-axis jet polishing machine. Background technique [0002] With the rapid development of modern optics, electronics, thin film science and aerospace science, the shapes of optical components and functional components are becoming more and more complex, the requirements for surface quality are becoming more and more stringent, and the application of ultra-smooth surfaces is becoming more and more high. In addition to the extremely high requirements on surface shape accuracy and surface roughness, the ultra-smooth surface also requires the surface to have a complete lattice structure and no defects, which can eliminate the processing damage layer. In 1998, Delft University in the Netherlands First, FJP technology was used, and it was used in the surface polishing of optical components and a surface roughness of 1.6nm was obtained, showing...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B24C3/02B24C7/00B24C9/00
Inventor 徐学锋张玉张羽
Owner BEIJING FORESTRY UNIVERSITY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com