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Hybrid evolutionary algorithm for triple-patterning

An algorithmic and integrated technology, applied in optics, computing, optomechanical equipment, etc., can solve the problems that double exposure technology cannot handle, design intent verification is difficult, etc.

Active Publication Date: 2015-11-11
SYNOPSYS INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the difficulty of design intent verification, the double exposure technique cannot handle design intent with more complex and higher pattern densities that need to be printed using triple or more multiple exposure techniques

Method used

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  • Hybrid evolutionary algorithm for triple-patterning
  • Hybrid evolutionary algorithm for triple-patterning
  • Hybrid evolutionary algorithm for triple-patterning

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Embodiment Construction

[0062] According to one embodiment of the present invention, triple exposure lithography is used to print complex design intent with a higher pattern density than that provided by direct lithographic printing or by double exposure techniques. In some embodiments, the design intent includes a two-dimensional pattern corresponding to any logical, analog, or analog-digital function implementing the circuit design. Embodiments of the present invention may be applied to multiple exposure lithography having a higher pattern density than triple exposure for future process technologies.

[0063] According to an embodiment of the present invention, verifying the design intent for the triple exposure process includes: determining whether the pattern representing the design intent is triple-colorable. Each vertex in the graph may correspond to a shape in the design intent, and each edge in the graph may correspond to two shapes in the design intent, the two shapes violate at least one de...

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Abstract

According to one embodiment of the present invention, a computer-implemented method for validating a design includes generating, using the computer, a first graph representative of the design, when the computer is invoked to validate the design, and decompose, using the computer, the first graph into at least three sets using a hybrid evolutionary algorithm to form a colored graph.

Description

[0001] Cross References to Related Applications [0002] This application claims priority under 35 U.S.C. §119(e) to U.S. Provisional Application No. 61 / 768,365, filed February 22, 2013, entitled "Hybrid Evolutionary Algorithm For Triple-Patterning," which is incorporated by reference in its entirety The content is incorporated herein. 本申请与YonchanBan等人的、名称为“MethodandApparatusForDeterminingMaskLayoutsForaSpacer-Is-DielectricSelf-AlignedDouble-PatterningProcess”的美国专利8,312,394以及Tsu-JaeKingLiu的、名称为“PatterningaSingleIntegratedCircuitLayerUsingMultipleMasksandMultipleMaskingLayers”的美国专利7,560,201有关,通过引用方式将其全部内容并 into this article. technical field [0003] The present invention relates to electronic design automation (EDA), and more particularly, to methods and systems for verifying mask layouts using triple exposure techniques. Background technique [0004] Improvements in semiconductor integration density have been achieved in large part by corresponding improvements in semicondu...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G06F17/50
CPCH01L21/3086G03F7/70433G03F7/70466
Inventor 埃德姆·奇林吉尔斯利尼·阿里卡提
Owner SYNOPSYS INC