114 results about "Design intent" patented technology

A laser scanner or a laser tracker includes a light source that emits a light beam within an environment, and a data capture component that captures the light beam reflected back to the laser scanner or tracker from the environment. The laser scanner or tracker also includes a projector integrated within a body of the laser scanner or tracker or mounted to the body of the laser scanner or tracker at a predetermined location, the projector being operable to project visible information onto an object located within the environment, the projected visible information being indicative of images, data or information, the projected visible information being at least one of design intent information, information acquired by the laser scanner or tracker, or guidance to an operator.

Programmatic extraction and management of solid and surface modeling parameters from raw 3D scan data is discussed. An automated process reads raw 3D scan data and works in communication with a CAD system able to perform CAD part modeling. The user is provided with an automatic function to segment a mesh model (formed from the raw 3D scan data) into dozens of mesh regions. A graphical user interface is provided which enables a user to choose a type of the design intent along with the mesh regions from which the design intent is calculated. Each design intent is represented in a vector, a plane or a poly-line depending upon the type of design intent. In response to a user demand for the parameters of a modeling feature, a best approximation of the requested parameter value is calculated by processing the raw 3D scan data using a set of functions.

A method and apparatus for integrated circuit layout optimization are provided. In the conventional art, the major challenges in building integrated circuits (IC) at sub-wavelength geometries include i) to ensure the design intent is faithfully transferred onto silicon; ii) to ensure the design is manufacturable, or with acceptable yield subject to process variations. The present invention provides the method to process a layout database to optimize or correct or fix layout violations or enhancements. The layout violations are identified through various means such as design rules, recommended rules, timing/signal integrity/power constraints, lithography rules, Resolution Enhancement Technologies (RET) requirements and preferences, and process and manufacturing constraints. Particularly, the method, techniques and procedures of creating software tools of the present invention used to perform the layout violations or enhancements are disclosed.

Design-specific attributes of a circuit (such as timing, power, electro-migration, and signal integrity) are used to automatically identify one or more regions of one or more layers in a layout of the circuit. The automatically identified regions may be provided to a manufacturing tool in GDSII by use of overlapping shapes in, or alternatively by moving existing shapes to, a different layer/datatype pair. For example, information about the automatically identified regions may be stored using a conventional datatype (e.g. value 0) with a new layer, or alternatively using a conventional layer (e.g. metal 3) with a new datatype (e.g. value 1), depending on the embodiment. The automatically identified regions contain cells and/or features (e.g. groups of shapes and/or individual shapes) whose tolerance in silicon (to be fabricated) is automatically changed from default, based on the design-specific attribute(s) and sensitivity thereto, expressed as design intent by a circuit designer.

In accordance with the present method and system for improving integrated circuit layout, a local process modification is calculated from simulated process response variables at a set of control points. Said modification values are incorporated into the layout constraints imposed by design rules and design intent to account for manufacturing friendliness. Solving the updated constraint equation with user specified objective function produces a new layout with increased manufacturability. The new layout may further contain data tags that enable optimal process correction to be performed on selected locations, leading to reduction in data size and mask complexity. Also in accordance with this invention, physical design tools are enhanced to read and process anisotropic design rules.

A software program for use in designing interior and exterior spaces receives user input that is associated with one or more attributes. Subsequent user input, having other attributes, is resolved in light of the first input attributes to create a real-world depiction of design choices in real-time. For example, design choices that conflict with prior design choices are resolved (or modified as necessary) to ensure that each of the prior and present user input choices are represented in an appropriate way. The resolution by the design software is also used to create an accurate parts (and/or price) list so that when the user has completed the design of an exterior or interior space, the design can be submitted directly as an order to be fulfilled. Generally, continual resolution ensures that the user's design intent is captured in an accurate and efficient way in a user interface.

A completely free form layout of the physical content of a publication. The publication is represented as an unstructured set of content objects whose design relationships are specified as separate relationship objects, all of which interact with objects representing the properties of the display media. Through this representation, the present invention is better able to capture, represent and display the design intent of a designer throughout the entire design process.

A method for measurement of a film cooling effect is disclosed. Film cooling is a technique developed to protect gas turbine engine components from the extremely high temperatures created during its operation. A controlled air pressure is ducted into the hollow interior of the component and the mass rate of air flowing through the plurality of film cooling features or openings is measured. A coolant is then injected into the hollow interior of the component and allowed to flow out of a film cooling feature onto the heated outer surface of the component. The resulting infrared signature is a measure of the relative cooling effect generated by the individual film cool feature. The film cooling effect for an individual feature is quantified as the proportion of mass rate of airflow contributed by its relative individual cooling effect. The area, location and shape of the cooling effect are further classified to determine the degree of conformance to its design intent.

The present disclosure relates to fracturing of polygon data, with one application being microlithography. In particular, it relates to preserving data regarding edges and/or vertices of the original polygons as the polygons are triangulated and even if the results of triangulation are further fractured.

The present invention discloses a mechanical product design two-dimensional knowledge pushing method based on design intents. The mechanical product design two-dimensional knowledge pushing method mainly comprises: establishing a mechanical product design intent database, establishing a design intent acquisition and decomposition method, constructing a design intent attribute table by a rough set theory and performing reduction to obtain the simplest design intent set; establishing a mechanical product design knowledge ontology database; and calculating similarity degrees between intent elements and a compared knowledge ontology in a sequential traversing manner by using an improved similarity degree matching algorithm based on a knowledge ontology concept semantic distance and a concept attribute, sequentially carrying out matching on each intent element, of which the similarity degree is greater than a threshold value, in an intent element set from large to small according to the similarity degrees until completing all the matching, and completing matching of the knowledge ontologies by utilizing a text semantic similarity degree calculating method. The mechanical product design two-dimensional knowledge pushing method can solve the problem of low knowledge intelligent degree of knowledge pushing in the mechanical product design, can improve efficiency of mechanical product design and is suitable for the requirement of the manufacturing information engineering technology for deepening development.

One embodiment provides a method for determining mask layouts. During operation, the system can receive a design intent. Next, the system can determine a set of critical edges in the design layout, and select a first edge and a second edge. The system can then determine a first trench and a second trench using the first edge and the second edge, respectively. Note that an edge of the first trench may substantially overlap with the first edge, and an edge of the second trench may substantially overlap with the second edge. Next, the system may assign the first trench and the second trench to the first mask layout and the second mask layout, respectively. The system can then increase the first trench and the second trench, thereby improving pattern fidelity. The resulting mask layouts may be used in a double patterning process.

A method of developing a stamping die for a workpiece is provided, which includes the steps of stamping a workpiece in a current die. A measurement is made of the stamped workpiece to determine its profile. The profile is compared with the design intent workpiece to determine dimensional variance. If the variance is within predetermined limits, the development is complete. If the variance is beyond limits, a conceptual determination is made of the residual forces in the current die stamped workpiece when the current die stamped workpiece is restamped by a design intent die. This conceptual determination is carried out on a computer. From the determination of residual forces, a new current die is developed. The new current die then stamps the workpiece. The steps are repeated until the stamped workpiece profile is within predetermined limits.

A method and apparatus for modeling and cross correlation of design predicted criticalities include a feedback loop where information from the manufacturing process is provided to cross correlation engine for optimization of semiconductor manufacturing. The information may include parametric information, functional information, and hot spots determination. The sharing of information allows for design intent to be reflected in manufacturing metrology space; thus, allowing for more intelligent metrology and reduces cycle time.

Computer implemented methods and systems for CAD data exchange, and in particular for creating boundary representations (“breps”) on a feature-by-feature basis are disclosed. According to an embodiment of the techniques described herein, a parameterized feature from a parametric based design system is exported from a source CAD system (404). Iterative steps and complimentary extraction techniques are employed by one or more processors (452, 456) to create an importable design model of the parameterized feature (433), which is imported into a target CAD system (408). While the techniques can include API (436), pattern matching (440), and user emulation (444) techniques, they include a brep per feature (450) technique. By exporting the brep on a per feature (453) basis from the source CAD system (404), the design intent of a CAD designer can be preserved on importation into the target CAD system (408). In particular, where a parametric representation (433) of the feature fails to import into the target system (408), an unparameterized representation (453) of the feature can be substituted.

A method and apparatus for merging design intent of multiple designers with respect to a digital model of an object are described. In one embodiment, the method includes receiving data concerning a change to the digital model performed by a fist designer. The method further includes analyzing the data concerning the change performed by the first designer and data concerning a digital model version created by a second designer, and integrating the change performed by the first designer into the digital model version created by the second designer.

Processes and apparatuses are described for modeling and correcting electron-beam (e-beam) proximity effects during e-beam lithography. An uncalibrated e-beam model, which includes a long-range component and a short-range component, can be calibrated based on one or more test layouts. During correction, a first resist intensity map can be computed based on the long-range component of the calibrated e-beam model and a mask layout. Next, a target pattern in the mask layout can be corrected by, iteratively: (1) computing a second resist intensity map based on the short-range component of the calibrated e-beam model and the target pattern; (2) obtaining a combined resist intensity map by combining the first resist intensity map and the second resist intensity map; and (3) adjusting the target pattern based on the combined resist intensity map and the design intent.