Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

An improved guiding method and device for intracranial puncture

A head and subsystem technology, applied in the direction of puncture needles, stereotaxic surgical instruments, trocars, etc., can solve the problems of complex implementation and inconvenient operation, and achieve clinical application, easy operation, and improved auxiliary guidance system for intracranial puncture Effect

Active Publication Date: 2017-06-30
ZHEJIANG UNIV OF TECH
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to overcome the deficiencies of the existing intracranial puncture auxiliary guidance method, which requires the patient's head coordinate system to be consistent with the ground coordinate system, complex implementation, and inconvenient operation, the present invention provides a method to complete the operation by compensating the angle difference between the head coordinate system and the ground coordinate system. Improved guidance method and device for intracranial puncture with matching of two coordinate systems, simple implementation and convenient operation

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • An improved guiding method and device for intracranial puncture
  • An improved guiding method and device for intracranial puncture
  • An improved guiding method and device for intracranial puncture

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0051] The present invention will be further described below in conjunction with the accompanying drawings.

[0052] refer to Figure 1 ~ Figure 3 , an improved intracranial puncture guiding method, the guiding method comprises the steps of:

[0053] 1) Puncture planning and navigation

[0054] 1.1) Load the head scan image sequence, build a three-dimensional model of the brain, and load the measurement angle correction data at the same time;

[0055] 1.2): Set the datum point and establish the datum reference plane perpendicular to each other in the 3D model;

[0056] 1.3): Set the target point and the entry point, calculate the length of the puncture path composed of the target point and the entry point and the angle between it and the reference reference plane determined by the reference point; correct it through the angle correction data to obtain the final planned puncture angle and depth;

[0057] 2) Puncture implementation

[0058] 2.1): The gyroscope acquires the ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

An improved encephalic puncture guiding method comprises the following steps of 1, puncture planning guidance, wherein 1.1, an encephalic scanning image sequence is loaded, a three-dimensional encephalic model is built, and meanwhile measurement angle correction data are loaded; 1.2, reference points are set, perpendicular reference planes are built in the three-dimensional model; 1.3, a target spot and an entry point are set, the length of a puncture path composed of the target spot and the entry point and the included angle between the puncture path and the reference planes are worked out; the final plan puncturing angle and depth are obtained by correcting the angle correction data; 2, puncture execution, wherein in the step 1.3, when an encephalic coordination system and a ground coordinate system are not consistent, the encephalic coordination system and the ground coordination system are registered by adopting the point registration method based on output data of a gyroscope, and the included angle between the reference planes and the puncture path obtained after registration is automatically worked out. The invention provides an improved encephalic puncture guiding device. The improved encephalic puncture guiding method and device are easy to implement and convenient to operate and facilitate clinical application.

Description

technical field [0001] The invention relates to a guiding method and device for intracranial puncture, which is used for intracranial puncture, belongs to the technical field of medical equipment, and can make the guiding system more practical and convenient in clinical application. Background technique [0002] Intracranial puncture is one of the effective surgical methods for the treatment of intracranial hematoma caused by hypertensive cerebral hemorrhage. Compared with craniotomy, puncture treatment of cerebral hemorrhage has the characteristics of less trauma, safety, reliability, simple operation, and lower price, and its application is becoming more and more extensive. However, the puncture direction angle and puncture depth often need to be determined by the doctor's experience and are greatly affected by human factors. Therefore, the implementation of puncture surgery often requires the use of some expensive and cumbersome navigation equipment, and it also needs to ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): A61B17/34A61B90/11
CPCA61B17/3403A61B17/3494
Inventor 潘清曹平方路平高坤徐仙明
Owner ZHEJIANG UNIV OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products