Plasma physical surface control system

Abstract

The invention discloses a plasma physical surface control system which comprises one set of Y-axis servo driving system, two sets of X-axis servo driving systems and two sets of scale shields of the same type. The scale shields are installed on basic baffles on the two sides in front of a twin target. Each scale shield comprises fourteen pieces of single-face scales chained to one another and the corresponding basic baffle. The single-face scales are installed on the basic baffles on the two sides of the twin target. The Y-axis servo driving system comprises a Y-axis servo motor, a Y-axis sliding bar and a Y-axis screw mechanism. The X-axis servo driving systems comprise X-axis servo motors, X-axis scale pushing rods, X-axis linear racks and X-axis transmission shafts. The plasma physical surface control system is directly set by a computer in a vacuum state, a plasma physical surface is regulated and controlled through servo driving transmission input and displacement of stainless steel pieces chained in a snake shape according to set coordinate points, and thus the purpose of uniformity of a sputter coating layer is achieved.

Description

technical field [0001] The invention relates to a control system, in particular to a plasma physical plane control system, which belongs to the field of magnetron sputtering coating. Background technique [0002] The uniformity of the magnetron sputtering coating layer directly affects the quality of the coated product, which is manifested in the uneven product transmittance, the color difference of the coating, the magnetron sputtering coating technology has always been set by the target core magnetic field intensity is not uniform, the sputtering target material Due to the changes of thickness and raw materials, the plasma density is changed and troubled by unevenness. In order to solve this technical problem, the Germans invented the plasma density control method (PEM). Due to the high investment cost of this method, its fiber probe is in The plasma is easily polluted by the coating, so it is difficult to promote. At present, most of the domestic magnetron sputtering coat...

AI Technical Summary

Problems solved by technology

[0002] The uniformity of the magnetron sputtering coating layer directly affects the quality of the coating product, which is manifested in the uneven transmittance of the product and the color difference of the coating. The magnetron sputtering coating technology has been set by the uneven magnetic field strength of the target core. The sputtering target Changes in thickness and raw materials lead to changes in plasma density and inhomogeneity. In order to solve this technical problem, the Germans invented the plasma density control method (PEM). Due to the high investment cost of this method, the fiber probe in The plasma is easily polluted by the coating, so it is difficult to promote. At present, most of the domestic magnetron sputtering coating lines are using the method of breaking the air to control the plasma physical surface. This method increases the pumping time due to the breaking of the air, and it is not necessarily once If the control is in place, there are many chances of secondary breakthrough. This control method increases the production cost to varying degrees.

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