Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Illumination test apparatus and test method for illumination uniformity and stray light

A technology of testing device and testing method, which is applied in the field of projection exposure, can solve problems such as insufficient sampling frequency of image plane space, achieve high-precision measurement, short test time, and solve the effects of insufficient sampling frequency

Active Publication Date: 2016-02-10
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
View PDF7 Cites 12 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to provide a lighting test device and a test method for lighting uniformity and stray light, which can solve the problem of insufficient sampling frequency of the image plane space, and can simultaneously realize high-precision measurement of small field of view lighting uniformity and stray light

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Illumination test apparatus and test method for illumination uniformity and stray light
  • Illumination test apparatus and test method for illumination uniformity and stray light
  • Illumination test apparatus and test method for illumination uniformity and stray light

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0046] The following is a more detailed description of the lighting test device and the test method of lighting uniformity and stray light of the present invention in conjunction with the schematic diagram. The preferred embodiments of the present invention are shown. It should be understood that those skilled in the art can modify the present invention described here. , While still achieving the advantageous effects of the present invention. Therefore, the following description should be understood to be widely known to those skilled in the art, and not as a limitation to the present invention.

[0047] For clarity, not all features of actual embodiments are described. In the following description, well-known functions and structures are not described in detail because they may confuse the present invention due to unnecessary details. It should be considered that in the development of any actual embodiment, a large number of implementation details must be made to achieve the de...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides an illumination test apparatus and a test method for illumination uniformity and stray light. A special detecting light path is added for realizing energy detection, and the problem of an insufficient sampling frequency in an image plane space is solved; a high-precision measurement for the illumination uniformity and stray light in small fields of view can be realized at the same time; compared with the conventional test method carried out by driving a point energy sensor through a motion table, the test method provided by the invention makes the test time shorter; and the stray light can be monitored in real time without requiring to load a mask.

Description

Technical field [0001] The invention relates to the field of projection exposure, in particular to an illumination testing device and a testing method for illumination uniformity and stray light. Background technique [0002] For the projection exposure system, the uniformity of the illumination system will directly affect the dose distribution of each point in the field of view. Therefore, the in-situ measurement of the illumination uniformity is a necessary function of any projection exposure device. In addition, the stray light of the illumination system will also reduce the imaging performance and the process window. Therefore, the monitoring of the stray light performance is also one of the necessary functions of the projection exposure device. [0003] Traditional projection exposure systems generally use a point energy sensor integrated on a moving table. The point energy sensor is driven by the moving table to collect the energy of each point in the field of view to obtain ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
Inventor 江传亮许琦欣王天寅
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products