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Automatic regulating apparatus of hot disc processing closed chamber

An automatic adjustment device, closed cavity technology, used in electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve problems such as personal injury, exhaust gas leakage, personal and company economic losses, and achieve a good contact area. Effect

Active Publication Date: 2016-02-10
SHENYANG KINGSEMI CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If the cavity is not well sealed during the hot plate process, the exhaust gas will leak out, which will cause great harm to the person and bring unnecessary economic losses to the individual and the company.

Method used

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  • Automatic regulating apparatus of hot disc processing closed chamber
  • Automatic regulating apparatus of hot disc processing closed chamber

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Embodiment Construction

[0019] The present invention will be described in further detail below in conjunction with the accompanying drawings.

[0020] Such as figure 1 , figure 2 As shown, the present invention includes a driving mechanism 1, a disc cover lifting mechanism 2, a disc cover, a sealing ring 7, a lower sealing body 8, a disc body 9 and a bottom plate 10, wherein the driving mechanism and the lower sealing body 8 are installed on the bottom plate 10 through a pillar 11 Above, the disc body 9 is arranged in the lower sealing body 8, and the disc cover is arranged on the upper end of the sealing body 8. The connected first process chamber a and the second process chamber c. The outer edge of the lower end surface of the disc cover is provided with a self-adjusting cavity b along the circumferential direction, and the outer edge of the upper end of the lower sealing body 8 is provided with a groove along the circumferential direction, and one end of the sealing ring 7 is accommodated in t...

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Abstract

The present invention relates to an apparatus for forming a closed chamber when wafers are processed in a hot disc, and specifically an automatic regulating apparatus of a hot disc processing closed chamber. The apparatus includes a driving mechanism, a disc cover elevating mechanism, a disc cover, a sealing ring, a low sealing body, a disc body and a base plate. The driving mechanism and the low sealing body are mounted on the base plate, the disc body is arranged in the low sealing body, the disc cover is arranged on the upper end of the sealing body, a processing chamber is formed among the disc body, the disc cover and the low sealing body, an automatic regulating chamber is arranged on the disc cover along the periphery, a groove is arranged on the low sealing body along the periphery, one end of the sealing ring is accommodated in the automatic regulating chamber, the other end of the sealing ring stretches out the automatic regulating chamber body and is connected with the groove on the upper end of the low sealing body in a cooperation mode, a processing air inlet and an adjusting air inlet are arranged on the disc cover, a processing waste gas outlet is arranged on the low sealing body, one end of the disc cover elevating mechanism is connected with the driving mechanism, and the other end of the disc cover elevating mechanism is connected with the disc cover. According to the invention, the processing waste gas leakage due to bad contact between the disc cover and the low sealing body can be avoided, and the full sealing in the processing chamber can be realized.

Description

technical field [0001] The invention relates to a device for forming a closed cavity when wafers are processed in a hot plate, in particular to an automatic adjustment device for the closed cavity of the hot plate process. Background technique [0002] At present, some waste gas and even toxic gas will be generated when the wafer is processed in the hot plate. These exhaust gases need to be discharged to designated places through special channels. If the cavity is not well sealed during the hot plate process, the exhaust gas will leak out, which will cause great harm to the person and bring unnecessary economic losses to the individual and the company. Therefore, there is a need for an automatic adjustment device for the cavity of the hot plate to keep the process chamber airtight. Contents of the invention [0003] In view of the above problems, the purpose of the present invention is to provide an automatic adjustment device for the closed chamber of the hot plate proc...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67
Inventor 王丽鹤
Owner SHENYANG KINGSEMI CO LTD
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