Substrate for organic electronic device
A technology for organic electronic devices and substrates, which is applied in the field of substrates for organic electronic devices and can solve problems such as not being effectively applied
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preparation Embodiment 1
[0081] Preparation Example 1: Manufacture of Polyimide Substrate (A)
[0082] The first polyamic acid solution (refractive index: about 1.625) was passed through 3,3',4,4'-diphenyltetracarboxylic dianhydride (BPDA) and p-phenylenediamine (PDA) in one reactor Synthesized by condensation reaction, the second polyamic acid solution (refractive index: about 1.56) is synthesized by condensation reaction of BPDA and 2,2'-bis(trifluoromethyl)benzidine (TFMB) in another reactor . The composition for forming a film is prepared by the following process: the first polyamic acid solution is mixed with the second polyamic acid solution at a ratio of 5:95 (first polyamic acid: second polyamic acid), based on solid The mixture was stirred using a stirrer for 16 hours or more based on the weight of the substance. Subsequently, the polyimide substrate (A) was synthesized by the following process: the composition for forming a film was spin-coated on a glass substrate with a thickness of abou...
preparation Embodiment 2
[0083] Preparation Example 2: Manufacture of Polyimide Substrate (B)
[0084] The polyimide substrate (B) was produced by the same method as described in Production Example 1, except that a film-forming composition prepared by the process of combining BPDA and TFMB through the condensation reaction of BPDA and TFMB was used. The prepared first polyamic acid solution (refractive index: about 1.56) and the second polyamic acid solution prepared by condensation reaction of 2,2'-bis-(3,4-dicarboxyphenyl)hexafluoropropane dianhydride (FDA) and TFMB Two polyamic acid solutions (refractive index: about 1.541) were mixed in a ratio of 5:95 (first polyamic acid:second polyamic acid) based on the weight of solids. The haze of the synthesized base film is about 5.12% and the light transmittance is about 86.4% according to ASTM D1003 using a haze meter HM-150.
preparation Embodiment 3
[0085] Preparation Example 3: Manufacture of Polyimide Substrate (C)
[0086] The polyimide substrate (C) was manufactured by the same method as described in Preparation Example 1, except that a film-forming composition prepared by the following process was used: the condensation reaction of BPDA and TFMB The prepared first polyamic acid solution (refractive index: about 1.56) and the second polyamic acid solution (refractive index: about 1.541) prepared by the condensation reaction of FDA and TFMB were prepared at a ratio of 10:90 (the first polyamic acid: the second Dipolyamic acid) ratio mixing. The haze of the synthesized base film is about 16.44% and the light transmittance is about 83.5% according to ASTM D1003 using a haze meter HM-150.
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Abstract
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