High-positioning-precision photoetching object lens frame with replaceable lens
A technology of positioning accuracy and lithography objective lens, which is applied in the direction of optics, optical components, optomechanical equipment, etc., can solve the problems of large operating space, low positioning and repeat positioning accuracy, complex structure, etc., and achieve the effect of high positioning accuracy
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[0028] Embodiments of the present invention will be further described below in conjunction with the accompanying drawings.
[0029] See attached figure 1 And attached figure 2 , the replaceable lithography objective lens frame of the high positioning accuracy lens of the present invention comprises an outer mirror frame 1, an inner mirror frame 2 and a protective cover 4;
[0030] See attached image 3 And attached Figure 4 , the outer mirror frame 1 is a cylindrical structure, and the inside of the outer mirror frame 1 is a square space, and the mirror frame has an opening opposite to any side wall of the square space, and the two sides of the square space perpendicular to the opening The wall is provided with a chute 102, one end of the side wall of the square space opposite to the opening is provided with a conical groove 104, and the other end is provided with a V-shaped groove 103, and the V-shaped groove 103 is connected to the upper end surface of the outer mirror ...
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