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A kind of 4D nail polish glue and using method thereof

A nail polish, 4D technology, applied in the field of cosmetic synthesis and generation, can solve problems such as injury, strong irritation of nail polish, and skin burns.

Active Publication Date: 2018-01-16
LES FINS NETWORK TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The Chinese invention patent application with the publication number CN102552059A discloses a low-irritation nail polish. The nail polish is mainly based on alcohol solvents and alcohol film-forming agents, and is equipped with thickeners, suspending agents, plasticizers, and pigment boxes. Flavor and other additives are stirred and mixed; however, this nail polish is very irritating, and it also has a certain burning sensation and injury when it touches the skin
[0005] Simultaneously, there is no healthy and environmentally friendly nail polish glue that is easy to peel or tear in the prior art.

Method used

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  • A kind of 4D nail polish glue and using method thereof
  • A kind of 4D nail polish glue and using method thereof
  • A kind of 4D nail polish glue and using method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0122] A 4D nail polish comprises the following components in parts by weight: 11,14-dioxa-2,9-diazaheptadecan-16-enoic acid-4,4,6,16-tetramethyl-10 , 38 parts of 15-dioxo-2-[(2-methyl-1-oxo-2-propenyl) oxy]ethyl ester;

[0123] 0.02 part of compound of formula I;

[0124] 25 parts of acrylate oligomer;

[0125] 2.4 parts of 1-hydroxycyclohexyl phenyl ketone;

[0126] 2.5 parts of bisphenylphosphine oxide (2,4,6-trimethylbenzoyl);

[0127] 11 parts of hydroxyethyl methacrylate;

[0128] 1.1 parts of triethanolamine;

[0129] Laureth - 210.7 parts;

[0130] 1.5 parts of mica;

[0131] After the above ingredients are mixed, stir at high speed and mix evenly to make a multi-functional 4D nail polish gel.

[0132] The preparation method of described triethanolamine is:

[0133] (1) Ethylene oxide and aqueous ammonia are sent into the reactor, and at a reaction temperature of 36°C and a reaction pressure of 100kPa, a condensation reaction is carried out to generate mono-, d...

Embodiment 2

[0142] A 4D nail polish comprises the following components in parts by weight: 11,14-dioxa-2,9-diazaheptadecan-16-enoic acid-4,4,6,16-tetramethyl-10 , 45 parts of 15-dioxo-2-[(2-methyl-1-oxo-2-propenyl) oxo] ethyl ester;

[0143] 0.04 part of compound of formula I;

[0144] 29 parts of acrylate oligomer;

[0145] 2.9 parts of 1-hydroxycyclohexyl phenyl ketone;

[0146] 3.1 parts of bisphenylphosphine oxide (2,4,6-trimethylbenzoyl);

[0147] 13 parts of hydroxyethyl methacrylate;

[0148] 1.4 parts of triethanolamine;

[0149] Laureth - 210.8 parts;

[0150] 2.8 parts of mica;

[0151] After the above ingredients are mixed, stir at high speed and mix evenly to make a multi-functional 4D nail polish gel.

[0152] The preparation method of described triethanolamine is:

[0153] (1) Ethylene oxide and aqueous ammonia are sent into the reactor, and at a reaction temperature of 38°C and a reaction pressure of 300kPa, a condensation reaction is carried out to generate mono-, ...

Embodiment 3

[0162] A 4D nail polish comprises the following components in parts by weight: 11,14-dioxa-2,9-diazaheptadecan-16-enoic acid-4,4,6,16-tetramethyl-10 , 40 parts of 15-dioxo-2-[(2-methyl-1-oxo-2-propenyl) oxo] ethyl ester;

[0163] 0.03 part of compound of formula I;

[0164] 28 parts of acrylate oligomer;

[0165] 2.7 parts of 1-hydroxycyclohexyl phenyl ketone;

[0166] 2.8 parts of bisphenylphosphine oxide (2,4,6-trimethylbenzoyl);

[0167] 12 parts of hydroxyethyl methacrylate;

[0168] 1.3 parts of triethanolamine;

[0169] Laureth - 210.8 parts;

[0170] 2.5 parts of mica;

[0171] After the above ingredients are mixed, stir at high speed and mix evenly to make a multi-functional 4D nail polish gel.

[0172] The preparation method of described triethanolamine is:

[0173] (1) Ethylene oxide and aqueous ammonia are sent into the reactor, and at a reaction temperature of 37°C and a reaction pressure of 200kPa, a condensation reaction is carried out to generate mono-, ...

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Abstract

The invention relates to a 4D nail polish gel and an application method of the 4D nail polish gel coordinated with an LED UV gel lamp. The 4D nail polish gel comprises materials of 11,14-Dioxa-2,9-diazaheptadec-16-enoicacid,4,4,6,16-tetramethyl-10,15-dioxo-2-[(2-methyl-1-oxo-2-propenyl)oxy]ethylester, a compound shown as the formula I in the description, acrylic oligomers, 1-hydroxycyclohexylphenylketone, bisphenyl phosphine oxide (2,4,6-trimethylbenzoyl) and the like. The nail polish gel has the base gel and sealing layer two-in-one effect, can be easily stripped in layer when being removed, is full in color and high in brightness, has excellent integration with nails, has better antibacterial performance, and is healthy and environment-friendly.

Description

technical field [0001] The invention relates to the field of cosmetic synthesis, in particular to a 4D nail polish gel and a method for using it in conjunction with an LED nail lamp. Background technique [0002] Nail polish is a very popular cosmetic product among women of all ages. Beauty lovers apply it on their nails in order to make their nails colorful; there are many brands of nail polish on the market. Good and bad. [0003] The Chinese invention patent application with the publication number CN102908266A discloses a kind of environment-friendly nail polish and its preparation method. The environment-friendly nail polish includes emulsion, film-forming agent, water-based environment-friendly color paste and deionized water; The body includes butyl acrylate, styrene, methacrylic acid and vinyl hydroxy silicone oil; the initiator is azobisisobutyronitrile; although the patent claims that its nail polish is an environmentally friendly nail polish, it is not. [0004] ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): A61K8/86A61K8/26A61K8/35A61K8/37A61K8/41A61K8/49A61K8/55A61K8/73A61K8/81A61K8/891A61Q3/02C07D498/16C08J3/24C08L51/08
CPCA61K8/26A61K8/35A61K8/37A61K8/41A61K8/498A61K8/55A61K8/736A61K8/8152A61K8/86A61K8/891A61Q3/02C07D498/16C08J3/24C08J2351/08
Inventor 赵明
Owner LES FINS NETWORK TECH
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