Film-forming mask and touch panel substrate
A film forming and masking technology, applied in ion implantation plating, conductive layer on insulating carrier, coating, etc., can solve the problems of poor film pattern position accuracy, film wrinkle, warpage, etc., and achieve improved position Accuracy, effect of suppressing deformation
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[0019] The embodiments of the present invention will be described in detail below based on the drawings. figure 1 It is a centerline cross-sectional view showing an embodiment of the film formation mask according to the present invention. The film forming mask 1 is used to form a thin film pattern on a substrate, and is configured to include a first mask 2 and a second mask 3.
[0020] The above-mentioned first mask 2 is used to form a film on a substrate through the opening pattern 4 to form a thin film pattern, and is a mask that becomes a main mask, such as figure 2 As shown in (a), the structure includes a resin film (hereinafter referred to as “resin mask 5”), a metal thin film 6 and a first frame 7.
[0021] Here, the above-mentioned resin mask 5 corresponds to a plurality of thin film patterns formed on a substrate, and a plurality of through opening patterns 4 having the same shape and size as the thin film pattern are formed, for example, a thickness of 10 μm to 30 μm. Le...
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