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Mask plate cleaning system

A cleaning system and mask technology, applied in the field of semiconductor equipment manufacturing, can solve problems such as easy contamination of thin films, and achieve the effects of improving yield and reducing dependence

Active Publication Date: 2016-06-08
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Aiming at the above-mentioned deficiencies in the prior art, the present invention provides a mask cleaning system to solve the problem that the thin film under the mask is easily polluted

Method used

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Embodiment Construction

[0050] The technical solutions in the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the present invention. Apparently, the described embodiments are part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0051] The following combination Figure 1-5 , to describe the technical solution of the present invention in detail.

[0052] like figure 1 As shown, the present invention provides a mask cleaning system. The mask cleaning system includes: a clamp 1 and a film protection device 2 . The clamp 1 is used to clamp the mask 3 in a horizontal suspension. The film protection device 2 is arranged under the fixture 1, and is used to block the film 31 arranged on the lower surface of the mask pla...

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Abstract

The invention provides a mask plate cleaning system, comprising a clamp and a film protector, wherein the clamp is used for horizontally clamping a mask plate in a way of hanging in the air; the film protector is arranged below the clamp, is used for shielding a film arranged on the lower surface of the mask plate, and is connected with the low surface of the mask plate around the film, so as to prevent flushing fluid for flushing the mask plate from polluting the film, reducing the dependency of a mask plate cleaning procedure on workers, improving the yield of mask plate production, and providing guarantee for realizing the mechanized large-scale mask plate cleaning procedure.

Description

technical field [0001] The invention relates to the technical field of semiconductor equipment manufacturing, in particular to a mask plate cleaning system. Background technique [0002] In recent years, TFT-LCD (ThinFilmTransistor-LiquidCrystalDisplay, Thin Film Transistor-Liquid Crystal Display) has been widely used in the field of display. In the process of manufacturing LCD screens, the production of thin film transistor array substrates is a very important part, and photolithography used As the core "props" of TFT production, the mask plate is particularly important for its maintenance and maintenance. [0003] Due to the existence of tiny dust and volatile gases inside the factory, the mask must be systematically cleaned and destaticized on a regular basis. At present, ion air guns and ion rods are basically used in factories to remove particles. For stubborn stains, high-grade dust-free cloths are generally used to soak in water or isopropyl alcohol (IPA) for wiping....

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/82
CPCG03F1/82
Inventor 黄文同胡静李亚文汪雄
Owner BOE TECH GRP CO LTD
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