Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Device for manufacturing uneven-thickness film, and method for manufacturing uneven-thickness film

一种制造装置、膜厚的技术,应用在合成树脂制的膜厚不均膜领域,能够解决长加压、过大压力、制造成本増加等问题

Active Publication Date: 2016-08-03
MITSUBISHI GAS CHEM CO INC +1
View PDF8 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, with the increase in the size of the liquid crystal screen, the size of the light guide plate is also increased, so a large injection molding machine is required, the production cost increases, excessive pressure is required to ensure transfer accuracy, relatively long pressurization, cooling time, etc. question

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Device for manufacturing uneven-thickness film, and method for manufacturing uneven-thickness film
  • Device for manufacturing uneven-thickness film, and method for manufacturing uneven-thickness film
  • Device for manufacturing uneven-thickness film, and method for manufacturing uneven-thickness film

Examples

Experimental program
Comparison scheme
Effect test

no. 1 approach

[0031] figure 1 It is a sectional view in a direction perpendicular to the extrusion (longitudinal) direction of a molded body of a film with uneven film thickness extrusion-molded by the manufacturing apparatus and method of the first embodiment. The shaped body 120 is composed of two sub-shaped bodies 120'. The sub-formed body 120' has a flat portion 122 having a uniform film thickness, a non-uniform film thickness portion 124 having a variable film thickness, and a connection portion 128 having a thinner film thickness than the flat portion 122. Preferably, the connecting portion 128 can be formed to have substantially the same film thickness between the disk-shaped portion 232 of the first roller 230 described later and the cylindrical portion of the second roller 240 . The upper surface of the molded body 120' is formed to stand up on the side of the uneven film thickness portion 124, and the lower surface of the molded body 120' is flat. The wall thickness (film thickn...

no. 2 approach

[0040] Figure 5 It is a cross-sectional view in a direction perpendicular to the extrusion direction of a molded body of a film with uneven film thickness that is extrusion-molded by the manufacturing apparatus and method of the second embodiment. The shaped body 220 is composed of two sub-shaped bodies 220'. The sub-formed body 220' has a flat portion 222 having a uniform film thickness, a non-uniform film thickness portion 224 having a variable film thickness, and a connection portion 228 having a thinner film thickness than the flat portion 222. The upper surface of the molded body 220' is formed to stand up from the uneven film thickness portion 224, and the lower surface of the molded body 220' is flat. The wall thickness (film thickness) of the uneven film thickness portion 224 decreases from the first side portion 226 on the connection portion 228 side to the second side portion 230 on the flat portion 232 side. The side portions 126 of the two uneven film thickness ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

This manufacturing device is provided with a first roller (230) and a second roller (240) for molding an uneven-thickness film. The first roller (230) is provided with a truncated-cone-shaped portion (234) and a disc-shaped portion (232), the diameter of the disc-shaped portion (232) is larger than the diameter of a large-diameter face (234b) of the truncated-cone-shaped portion (234), and the second roller (240) is provided with a column-shaped portion. A thick part is formed in a molded body of the uneven-thickness film between the truncated-cone-shaped portion (234) of the first roller (230) and the column-shaped portion of the second roller (240), and a thin connecting part is formed in the molded body between the disc-shaped portion (232) of the first roller (230) and the column-shaped portion of the second roller (240).

Description

technical field [0001] The present invention relates to a synthetic resin non-uniform film thickness film, for example, an apparatus and method for producing a film thickness non-uniform film used in a light guide plate used in a backside illumination device of a liquid crystal display device. Background technique [0002] In liquid crystal display devices such as tablet PCs and smartphones, an edge-light type light guide plate (light guide film) is used as a backlight. The edge light type light guide plate injects light from one side (light incident surface) of a transparent plate that is a rectangular plate-shaped body, and emits the incident light from the surface (light exit surface). The backlighting device is provided with a light source on at least one side of the light guide plate. A member (hereinafter referred to as “deflection member”) that changes the traveling angle of light transmitted from the inside of the light guide plate is provided on the surface (light ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B29C47/88B29C47/14B29L7/00B29C48/08B29C48/12B29C48/305
CPCB29C2043/466G02B6/0065B29C2043/463B29C2793/0063B29C2793/009G02B6/002B29C48/08B29C48/12B29C48/914B29C48/0011B29C43/24B29K2069/00B29K2995/0026B29L2011/0075B29C43/46B29C43/222B29D11/00663B29K2033/00
Inventor 秋田励纪
Owner MITSUBISHI GAS CHEM CO INC
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products