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Spin coater with substrate heating and atmosphere treatment

A technology of glue dispenser and tape base, which is applied to devices and coatings that apply liquid to the surface, which can solve problems such as clogging of glue drop, failure of substrate adsorption, and reduction of vacuum adsorption force.

Active Publication Date: 2016-09-28
INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] There are several problems with ordinary glue homogenizers: 1. There is a large difference between the speed marked on the equipment and the actual speed of the motor
2. If the structure of the vacuum adsorption system is not reasonable enough, the vacuum adsorption force will be reduced, which will cause the substrate to be unable to absorb and produce "flying pieces", and will also allow the dripping liquid to accidentally enter the vacuum pipeline system and cause complete blockage
3. Ordinary glue homogenizers do not have an atmosphere to process samples, so they can only be used for pure physical spin coating

Method used

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  • Spin coater with substrate heating and atmosphere treatment

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] 50. Movable nozzle with direction adjustment, angle adjustment range -60° to 60°; 30. Lifting bracket with translation, translation range 0 to 1031m, lifting range 0-1031m; 31. With air hole storage table to meet fluid mechanics Design; speed range 0-6000rpm / s, controlled in two gears: low gear 1-500rpm / s, time range 0-30S; high speed gear 500-6000rpm / s, time range 0-60S. The heating range of the storage table is 0-300°C; the storage table is driven by the motor to rotate and can vibrate up and down at the same time. 10. Stainless steel cylindrical cavity 70. Composed of no oil pump.

Embodiment 2

[0036] 50. Movable nozzle with direction adjustment, angle adjustment range -80° to 80°; 30. Lifting bracket with translation, translation range 0 to 1231m, lifting range 0-1231m; 31. Storage table with air outlet slot, storage table The distribution of air grooves meets the design of fluid mechanics; the speed range is 0-8000rpm / s, which is controlled in two gears: low gear 1-300rpm / s, time range 0-20S; high speed gear 300-8000rpm / s, time range 0-100S. The heating range of the storage table is 0-300°C; the heating range of the storage table is 0-200°C; the storage table is driven by the motor to rotate and can vibrate up and down at the same time. 10. Stainless steel cylindrical cavity 70. Composed of no oil pump.

Embodiment 3

[0038] 50. Movable nozzle with direction adjustment, the angle adjustment range is -50° to 50°; 30. Lifting bracket with translation, the translation range is 0 to 831m, and the lifting range is 0-831m; 31. With air hole storage table, storage table air hole The distribution meets the design of fluid mechanics; the speed range is 0-10000rpm / s, and it is controlled in two gears: the low gear is 1-600rpm / s, and the time range is 0-30S; the high gear is 600-10000rpm / s, and the time range is 0-80S. The heating range of the storage table is 0-200°C; the storage table is driven by the motor to rotate and can vibrate up and down at the same time. 10. Stainless steel cylindrical cavity 70. Composed of no oil pump.

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PUM

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Abstract

Disclosed is a spin coater with substrate heating and atmosphere treatment. The spin coater comprises a cylinder, a vertical shaft, a lifting support, an air inlet pipeline, a movable nozzle, a stand column, a pump and a top cover. The vertical shaft is located in the middle of the cylinder and penetrates the bottom of the cylinder; the lifting support is located on the vertical shaft, an object containing table is arranged at the upper end of the lifting support, and the lifting support can rotate; the air inlet pipeline is led into the cylinder from the outer portion of the cylinder; one end of the movable nozzle is connected with the air inlet pipeline, and the other end of the movable nozzle is aligned with the object containing table at the upper end of the lifting support; the stand column is fixed to one side inside the cylinder, a supporting arm is connected to the upper end of the stand column, the other end of the supporting arm is connected with the movable nozzle, and the supporting arm is adjusted to achieve the aim of controlling the direction of the movable nozzle; the pump is connected with the object containing table at the upper end of the lifting support through the vertical shaft, is used for pumping and exhausting gas and ensures adsorption and desorption of a sample; and the top cover is buckled above the cylinder. According to the spin coater, under the condition of atmosphere treatment, a substrate is spirally coated with a thin film, and therefore the effect that the chemical reaction is carried while spiral coating of the thin film is carried out is achieved.

Description

technical field [0001] The invention belongs to semiconductor process equipment, and particularly refers to a glue leveler with substrate heating and atmosphere treatment. The equipment can spin-coat thin films under the condition of atmosphere treatment, so that the effect of spin-coating thin films while chemical reactions can be realized. Therefore, the additional function of the glue homogenizer is increased. Background technique [0002] The principle of the traditional glue homogenizer is usually to drip various solutions on the high-speed rotating substrate, and use the centrifugal force generated by the rotation of the tray to make the solution dripped on the substrate evenly coated on the substrate, and the thickness depends on different solutions and substrates. The viscosity coefficient varies with each other, and it is also related to the rotation speed and time. There are many titles for the coating machine, also known as spinning machine, coating machine, rota...

Claims

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Application Information

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IPC IPC(8): B05C5/02B05C9/14B05C11/08
CPCB05C5/0208B05C9/14B05C11/08
Inventor 黄芳袁国栋李晋闽
Owner INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI