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Optical microcavity structure, manufacturing method and measuring method

An optical microcavity and optical film technology, applied in the field of detection, can solve the problems of film scratch damage, limited measurement accuracy, sample damage, etc., and achieve the effects of enhancing reflection interference, improving measurement accuracy, and improving accuracy.

Inactive Publication Date: 2017-01-25
SOUTH UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the measurement accuracy of this method is limited, especially for softer films, such as organic films. Due to the small diameter of the probe tip, the film is easily scratched and damaged during the measurement process.
[0005] In order to solve the problem of damage to the sample, a measurement method for measuring film thickness by optical interferometry has been developed in the prior art

Method used

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  • Optical microcavity structure, manufacturing method and measuring method
  • Optical microcavity structure, manufacturing method and measuring method
  • Optical microcavity structure, manufacturing method and measuring method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0048] In order to obtain more obvious sharp interference peaks, such as image 3 Shown is a schematic structural view of the optical microcavity structure used to measure the thickness of the optical film provided by Embodiment 1 of the present invention. The optical microcavity structure is mainly used in the small test process of industrial thin films, or for the production and manufacture of industrial thin film instruments and equipment in the process of verifying. The specific structure of the optical microcavity structure is as follows:

[0049] a total reflection layer, the total reflection layer is carried on a substrate;

[0050] The thin film layer to be measured is arranged on the surface of the reflective layer;

[0051] The semi-reflective film layer is arranged on the surface of the film layer to be tested. Because the film layer medium to be tested is different from the semi-reflective film layer medium. The incident light enters the film layer to be tested...

Embodiment 2

[0057] In Embodiment 1, the contact surface of the total reflection layer 21 and the film layer 22 to be tested forms the second medium interface, and the contact surface of the film layer 22 to be tested and the semi-emitting film layer forms the first medium interface. Then a sharper interference peak is formed. In the above technical solution, in addition to light interference generated in the thin film layer 22 to be tested, light interference may also occur in the semi-reflective film layer 23, thereby affecting the detection accuracy.

[0058] The upper surface of the semi-reflective film layer 23 is air, and the air and the surface of the semi-reflective film layer 23 form a third medium interface, and then the incident light produces light interference in the semi-reflective film layer 23, thereby affecting the detection accuracy. In order to overcome this defect, the present application further provides an optical microcavity structure, including,

[0059] A total ref...

Embodiment 3

[0066] Figure 4 It is a schematic flowchart of the method for fabricating an optical microcavity structure provided by Embodiment 3 of the present invention.

[0067] A method for making an optical microcavity structure, which specifically includes,

[0068] providing a total reflection layer disposed over a substrate;

[0069] A film layer to be measured is evaporated and deposited on the surface of the total reflection layer; further, at 5*10 -4 The evaporation deposition operation was carried out in Pa vacuum.

[0070] Evaporate and deposit a half reflective film layer on the surface of the side layer of the film to be tested, further, at 5*10 -4 The evaporation deposition operation was carried out in Pa vacuum.

[0071] Further, the glass substrate is used to form the substrate, and the silver reflective film side is used to form a total reflection layer and a semi-reflection film layer. The specific method for making the optical microcavity structure includes:

[00...

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Abstract

The invention discloses an optical microcavity structure, a manufacturing method and a measurement method for measuring the thickness of an optical film, wherein an optical microcavity structure includes a total reflection layer, and the total reflection layer is carried on a substrate; The thin film layer to be measured is arranged on the surface of the reflective layer; the semi-reflective film layer is arranged on the surface of the thin film layer to be measured. In the present application, the contact surface of the semi-reflective layer and the film layer to be tested forms the first medium interface, and the contact surface of the film layer to be tested and the full emission film layer forms the second medium interface. The incident light is repeatedly reflected back and forth between the first medium interface and the second medium interface, and a beam of light passes through the first medium interface and the second medium interface to form multiple beams to produce interference effects, so that the reflection spectrum It presents a more obvious sharp interference peak, which is conducive to more accurate spectral fitting in the subsequent measurement process and improves the measurement accuracy of the thickness of the film to be measured.

Description

technical field [0001] Embodiments of the present invention relate to detection technology, and in particular to an optical microcavity structure, manufacturing method and measurement method. Background technique [0002] Today's microelectronic films, optical films, anti-oxidation films, giant magnetoresistance films, high-temperature superconducting films, etc. are continuously applied in industrial production and human life. The thickness of industrially produced films is a very important parameter. Film thickness It refers to the distance between the surface of the substrate and the surface of the film. In fact, any small change in the thickness of the film will have a direct impact on the performance of the integrated circuit. In addition, the mechanical properties, light transmission properties, magnetic properties, thermal conductivity, and surface structure of thin film materials are closely related to the thickness. [0003] The existing method for measuring optica...

Claims

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Application Information

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IPC IPC(8): G01B11/06
CPCG01B11/0675
Inventor 陈树明冯渊翔王为高
Owner SOUTH UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA
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