Curved photomask, curved device with color photoresist pattern and manufacturing method thereof
A technology of color photoresist and curved surface, which is applied in the photoplate making process of pattern surface, photoplate making process exposure device, identification device, etc. It can solve the problems of poor line resolution, low processing cost, high material cost, etc., and achieve material cost reduction. Low cost, low processing cost, high line resolution effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0034] In order to make the above and other objects, features, and advantages of the present invention more comprehensible, several preferred embodiments will be described in detail below together with the accompanying drawings.
[0035] According to an embodiment of the present invention, the present invention provides a curved surface device with a color photoresist pattern and a manufacturing method thereof. By forming a multi-layer color photoresist and performing one exposure, a high-resolution, low-cost, High productivity, shell patterns that can be produced on curved surfaces.
[0036] Please refer to Figure 1A and Figure 3A-Figure 3G , an embodiment of the flowchart of the manufacturing method of the color photoresist pattern of the present invention, which can produce figure 2 The mobile phone curved substrate includes the following main steps:
[0037] Step 101: sequentially forming a color photoresist composite layer of at least two color photoresist layers on ...
PUM
| Property | Measurement | Unit |
|---|---|---|
| thickness | aaaaa | aaaaa |
| width | aaaaa | aaaaa |
| hardness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 


