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Curved photomask, curved device with color photoresist pattern and manufacturing method thereof

A technology of color photoresist and curved surface, which is applied in the photoplate making process of pattern surface, photoplate making process exposure device, identification device, etc. It can solve the problems of poor line resolution, low processing cost, high material cost, etc., and achieve material cost reduction. Low cost, low processing cost, high line resolution effect

Active Publication Date: 2020-10-16
恒煦电子材料国际有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The processing cost of this method is low, but the processing speed is slow, the material cost is high, and the line resolution is poor

Method used

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  • Curved photomask, curved device with color photoresist pattern and manufacturing method thereof
  • Curved photomask, curved device with color photoresist pattern and manufacturing method thereof
  • Curved photomask, curved device with color photoresist pattern and manufacturing method thereof

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Embodiment Construction

[0034] In order to make the above and other objects, features, and advantages of the present invention more comprehensible, several preferred embodiments will be described in detail below together with the accompanying drawings.

[0035] According to an embodiment of the present invention, the present invention provides a curved surface device with a color photoresist pattern and a manufacturing method thereof. By forming a multi-layer color photoresist and performing one exposure, a high-resolution, low-cost, High productivity, shell patterns that can be produced on curved surfaces.

[0036] Please refer to Figure 1A and Figure 3A-Figure 3G , an embodiment of the flowchart of the manufacturing method of the color photoresist pattern of the present invention, which can produce figure 2 The mobile phone curved substrate includes the following main steps:

[0037] Step 101: sequentially forming a color photoresist composite layer of at least two color photoresist layers on ...

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Abstract

The disclosure illustrates a curve-shaped mask, a curved device having colorful light resisting pattern and method for manufacturing the same. The curved device includes a curved substrate and at least two colorful light resisting layers. The at least two colorful light resisting layers are formed on the curved substrate, and construct a visible pattern together. The present invention provides a curve-shaped mask, a curved device having a colorful light resisting pattern and a method for manufacturing the same, to achieve effects of low cost in process and material, fast process speed, and high resolution of circuit, so as to solve the conventional technical problems of low process speed, high cost in material and low resolution of circuit.

Description

technical field [0001] The invention relates to a color photoresist, in particular to a curved mask, a curved device with a color photoresist pattern and a manufacturing method thereof. Background technique [0002] Currently, smart devices such as smart phones, smart watches, and smart medical equipment are all equipped with large screens for users to view information on the screens. In addition to powerful functions, these devices with large screens are gradually moving towards personalized and beautiful design, including appearance, shape, color and so on. All of this must be achieved through admirable case design and manufacture. At present, the curved shell shape is particularly attractive, and it is gradually becoming the future trend of smart devices. [0003] At present, there are several construction methods for the pattern production of the curved shell of the smart device: The first construction method: transfer printing technology. Through the pre-made flat pa...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/60G03F1/76G03F7/00G03F7/20G09F9/30
Inventor 许铭案林文福
Owner 恒煦电子材料国际有限公司