Method of manufacturing pixel structure and pixel structure

Abstract

The present invention discloses a method of manufacturing a pixel structure and the pixel structure. The method of manufacturing the pixel structure comprises the steps of forming a source, a drain and a first capacitor electrode; forming a part of a semiconductor layer contacted with the source and a part of the drain; forming a gate and a second capacitor electrode, wherein the second capacitor electrode roughly aligns at the first capacitor electrode; forming a gate dielectric layer located between the semiconductor layer, the source, the drain and the first capacitor electrode and the gate and the second capacitor electrode; forming a protection layer on the source, the drain, the first capacitor electrode, the semiconductor layer, the gate and the second capacitor electrode; forming a pixel electrode on the protection layer, wherein the pixel electrode roughly aligns at the first capacitor electrode. According to the method, on the condition of not changing the surrounding circuits, the pixel structure containing a bottom gate type thin film transistor or the pixel structure containing a top gate type thin film transistor can be manufactured, and the formed two pixel structures both have the enough capacitance.

Description

technical field [0001] The invention relates to a method for manufacturing a pixel structure and the pixel structure. Background technique [0002] Electronic paper is a paper-like ultra-thin, light, flexible, and low-power display technology. At present, the research of electrophoretic display technology (electrophoretic display; EPD) and cholesteric liquid crystal display technology is the main research. Among them, the electrophoretic display technology is the most widely used. In 2009, more than 90% of the world's electronic paper adopts the electrophoretic display technology. [0003] An electronic paper display (or an electronic ink display) generally includes a first transparent substrate, a common electrode layer, an electronic ink layer, a pixel array, and a second transparent substrate. A pixel array includes multiple pixel structures. Each pixel structure includes at least one thin film transistor. The thin film transistor includes a gate, a gate dielectric lay...

AI Technical Summary

Problems solved by technology

But generally speaking, if the pixel structure is to have good device characteristics, such as having sufficient capacitance, the pixel structure including one type (such as bottom-gate) thin film transistor and the circuit layout of its surrounding circuits cannot be directly applied. In the pixel structure containing another type (such as top-gate) thin film transistor and its surrounding circuits

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