Photoresist stripping apparatus and photoresist stripping method using same
A photoresist and equipment technology, applied in the field of photoresist removal equipment, can solve the problems of reduced peeling ability of the stripper, large evaporation and the like
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preparation example
[0067]
[0068] 38% by weight of distilled water, 10% by weight of (1-amino)-isopropanol (AIP), 10% by weight of N-methylformamide (NMF), 41.9% by weight of diethylene glycol monobutyl ether (BDG ) and 0.1% by weight of 2,2'-[[(methyl-1H-benzotriazol-1-yl)methyl]imino]bisethanol were mixed to prepare a stripper for removing photoresist.
[0069]
[0070] Such as figure 1 As shown in, put the stripping agent for removing photoresist obtained in the preparation example into the stripping agent storage tank for removing photoresist in the stripping chamber, use a pump to lift it to the shower nozzle, and It was sprayed into the stripping chamber at 40°C for 24 hours. The substance evaporated during the spraying process was moved via tubes to a cooling device and cooled to a temperature of 25°C. The cooled mass is injected via the tube into the stripper reservoir for photoresist removal.
experiment example
[0073]
[0074] The efficiencies of the photoresist removal methods of Examples and Comparative Examples were measured in the following manner, and the results are shown in Table 1 below.
[0075] 1. Moisture content (weight%)
[0076] In the photoresist removal methods of Examples and Comparative Examples, a certain amount of stripper for removing photoresist contained in the stripper storage tank for removing photoresist was collected every 6 hours, and according to Karl Fischer water The assay measures water content.
[0077] 2. Retention rate of stripping agent used to remove photoresist (%)
[0078] In the photoresist removal methods of Examples and Comparative Examples, the quality of the stripper for removing photoresist contained in the stripper storage tank for removing photoresist was measured every 6 hours, and according to the following formula 1 Obtain the retention rate of the stripper used to remove the photoresist.
[0079] [Formula 1]
[0080] Retention ...
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