Arc atmospheric pressure plasma device

An atmospheric and plasma technology, applied in electrical components, circuits, discharge tubes, etc., can solve the problems of uneven plasma processing, poor reliability and quality, and the plasma processing path 100 cannot completely cover the processing surface.

Inactive Publication Date: 2017-03-08
CREATING NANO TECH INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in this technique, the nozzle is an electrode of the plasma device, and the nozzle of a rotating electrode has considerable disadvantages
For example, if figure 1 As shown, when the plasma scanning speed is too fast to keep up with the plasma nozzle rotation speed, the plasma processing path 100 cannot completely cover the treated surface 102
In this way, it will lead to uneven plasma treatment, making the treatment reliability and quality poor

Method used

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Embodiment Construction

[0025] Please refer to figure 2 , which is a device diagram illustrating an arc-type atmospheric plasma device according to an embodiment of the present invention. In some embodiments, the arc atmospheric plasma device 200 mainly includes a first electrode 206 , a nozzle 204 and a second electrode 202 . The first electrode 206 is configured to be connected to a power supply 242 . The first electrode 206 can be, for example, a rod-shaped electrode, such as figure 2 shown. The first electrode 206 can also be a hollow electrode. In some examples, the power supply 242 is a high frequency high voltage power supply. In some exemplary examples, the output frequency of the power supply 242 is 1 kHz to 60 kHz, and the voltage of the power supply 242 is 5 kV to 20 kV.

[0026] The second electrode 202 may be a tubular electrode having a chamber 208 . Also, the second electrode 202 is grounded. In addition, two opposite ends of the second electrode 202 have openings 212 and 214 ...

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Abstract

An arc atmospheric pressure plasma device is described. The arc atmospheric pressure plasma device includes a first electrode, a second electrode and a nozzle. The first electrode is configured to connect to a power supply. The second electrode has a chamber and is grounded. The first electrode is located within the chamber. The nozzle is connected to a bottom of the second electrode, and has at least two nozzle channels. The nozzle channels communicate with the chamber. Because the plasma nozzle includes a plurality of nozzle channels, such that an ejected amount of plasma is increased, and a plasma treatment path becomes denser. Thus, a treatment area of a plasma scanning operation can be increased.

Description

technical field [0001] The present invention relates to a plasma device, and more particularly to an arc atmospheric pressure plasma device. Background technique [0002] Atmospheric plasma has been widely used in surface treatment in various fields to improve the reliability of adhesion, printing, packaging, die-attaching and other processes. However, due to the characteristics of arc negative resistance, arc-type atmospheric plasma cannot simultaneously generate large-area arc discharge, which makes the treatment range of arc-type atmospheric plasma limited, thus limiting the application of this type of plasma. [0003] Fortunately, although the arc-type atmospheric plasma cannot generate a large area of ​​arc discharge at the same time, its discharge density is relatively high, and more active substances are produced, so the processing speed is extremely fast. Therefore, the surface treatment of the object can be completed only by scanning in a short time. Thereby, the ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J37/32
CPCH01J37/3244H01J37/32532H05H1/34H05H1/32H05H1/3463H05H1/36
Inventor 洪昭南徐逸明王立民
Owner CREATING NANO TECH INC
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