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Exposure equipment and exposure method

An exposure method and equipment technology, applied in microlithography exposure equipment, optomechanical equipment, photolithography process exposure devices, etc., can solve problems such as reducing production efficiency, increasing manufacturing costs, etc., to improve productivity and save masks. Effect

Active Publication Date: 2018-03-30
WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In the process of realizing the above-mentioned exposure using a mask, the inventors found that in the prior art, when using exposure equipment for exposure, most of them can only expose one substrate with one mask in one exposure chamber. Increased manufacturing costs and reduced production efficiency

Method used

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  • Exposure equipment and exposure method
  • Exposure equipment and exposure method

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Embodiment Construction

[0036] In order to further illustrate the technical means adopted by the present invention and its effects, the following describes in detail in conjunction with preferred embodiments of the present invention and accompanying drawings.

[0037] see figure 2 , the present invention firstly provides an exposure device, including a mask 110, a first platform 121 arranged on the left side of the mask 110, and a second platform 122 arranged on the right side of the mask 110. , the first light source 131 arranged on the upper right side of the mask 110, the second light source 132 arranged on the upper left side of the mask 110, and the mask 110, the first platform 121, the second The second platform 122 , the first light source 131 , and the exposure chamber of the second light source 132 (not shown).

[0038] Wherein, the first platform 121 and the second platform 122 are both used to carry the substrate 200; the light emitted by the first light source 131 passes through the mas...

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Abstract

The invention provides exposure equipment and an exposure method. The exposure equipment comprises a mask, a first platform, a second platform, a first light source and a second light source, wherein the first platform is arranged at a position below a left side of the mask, the second platform is arranged at a position below a right side of the mask, the first light source is arranged at a position above the right side of the mask, the second light source is arranged at a position above the left side of the mask, the first platform and the second platform are both used for bearing substrates, a light ray emitted from the first light source passes through the mask and irradiates the first platform, and a light ray emitted from the second light source passes through the mask and irradiates the second platform. The exposure equipment is provided with the two light sources, when the exposure equipment is used for exposure, the purpose of simultaneously exposing the two substrates in an exposure cavity by using the mask can be achieved by reasonably arranging an optical path, so that the yield can be improved, and the mask is saved.

Description

technical field [0001] The invention relates to the field of display technology, in particular to an exposure device and an exposure method. Background technique [0002] In the field of display technology, flat-panel displays such as Thin Film Transistor-Liquid Crystal Display (TFT-LCD) and Active-matrix Organic Light-Emitting Diode (AMOLED) displays have gradually replaced cathode ray tubes. (Cathode RayTube, CRT) displays are widely used in LCD TVs, mobile phones, personal digital assistants, digital cameras, computer screens or laptop screens, etc. [0003] In the manufacturing process of TFT-LCD and AMOLED, the patterning process is used many times. Specifically, a mask (Mask) is placed above the substrate coated with photoresist, and then the substrate is exposed by an exposure method. Specifically, the exposure method emits ultraviolet (UV) light by turning on an ultra-high pressure mercury lamp, and the mask is exposed to light. The image information is transferred...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/7005G03F7/70208G03F7/70433
Inventor 朱美娜
Owner WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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