Photoconductive detector based on boron-doped silicon quantum dot/graphene/silicon dioxide and preparation method thereof
A technology of silicon dioxide and quantum dots, which is applied in the field of photoelectric detection, can solve the problems of non-absorption and zero infrared light, and achieve the effect of high optical response, simple preparation process and elimination of dead layers.
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[0024] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.
[0025] Such as figure 1 As shown, the present invention provides a photoconductive detector based on boron-doped silicon quantum dots / graphene / silicon dioxide, comprising: p-type silicon substrate 1, silicon dioxide isolation layer 2, top electrode 3, graphene Film 4, boron-doped silicon quantum dot film 5 and bottom electrode 6; wherein, the upper surface of the p-type silicon substrate 1 is covered with a silicon dioxide isolation layer 2, and the upper surface of the silicon dioxide isolation layer 2 is covered with two top The electrode 3 is covered with a graphene film 4 on the upper surface of the two top electrodes 3 and the upper surface of the silicon dioxide isolation layer 2 between the two top electrodes 3, and covered with a boron-doped silicon quantum dot film 5 on the upper surface of the graphene film 4, A bottom electrode 6 is provided...
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