The invention discloses a 
tellurium-
cadmium-mercury grid-controlled structure 
photoconductive detector for Hall test. The 
tellurium-
cadmium-mercury grid-controlled structure 
photoconductive detector structurally comprises a substrate, a 
tellurium-
cadmium-mercury material, 
epoxy resin glue, a ZnS 
passivation layer, four Hall electrodes, a transparent grid 
electrode and a thickened 
electrode, the substrate is a 
sapphire wafer, the tellurium-cadmium-mercury material grows an 
anodic oxide layer after double-faced rough 
polishing and fine 
polishing, the 
epoxy resin glue is used for bonding the tellurium-cadmium-mercury material and the substrate, the ZnS 
passivation layer can function in passivating the surface of the material and increasing permeability, the four Hall electrodes positioned in the front and the rear grow on the tellurium-cadmium-mercury material and serve as 
signal extraction electrodes for the Hall test and device performance test, the transparent grid 
electrode grows on the ZnS 
passivation layer and is used for applying 
grid voltage to a device, and the thickened electrode grows on the transparent grid electrode. The 
detector with the structure can apply the 
grid voltage in the device performance test process and the Hall test process to obtain needed electrical parameter conditions such as the 
grid voltage, material carrier concentration and mobility when device performances are optimal, and the development process of the device is greatly shortened.