Ultraviolet-near infrared broadband photoconductive detector
An ultraviolet band and near-infrared technology, applied in semiconductor devices, electrical components, circuits, etc., can solve the problems of low optical responsivity, narrow band range, and difficulty in realizing dual-band detection, and achieve the effect of broadening the spectral response range.
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[0024] Please refer to figure 1 The shown structural schematic diagram of the first embodiment of a UV-near-infrared broadband photoconductive detector provided by the present application includes:
[0025] The GaAs material substrate layer 1 has good light absorption characteristics and high responsivity in the near-infrared band, and can be used to detect the near-infrared wide band; here, the type of the GaAs material substrate layer 1 is, for example, n- or p-light doped substrate structure, and its thickness is 0.3-0.5 mm;
[0026] Bi 2 Se 3 The material layer 2 is arranged on the upper surface of the GaAs material substrate layer 1. It has good light absorption characteristics in the ultraviolet and visible light bands, and is easy to integrate with other semiconductor materials, and can be used to detect the ultraviolet band; here, Bi 2 Se 3 The thickness of material layer 2 is 20-100nm;
[0027] Among them, Bi 2 Se 3 The material layer 2 can be directly grown on...
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