Focused anode layer ion source device

Abstract

The invention discloses a focused anode layer ion source device, which comprises a shell, wherein an anode ring and a cathode ring are oppositely arranged in the shell at an interval; an intake pipe is also fixedly arranged on the shell; the surfaces of the anode ring and the cathode ring are circular conical surfaces; the cathode ring comprises an outer cathode ring and an inner cathode ring; the outer cathode ring and the inner cathode ring are arranged in the same circular conical surface; and the conical surface of the anode ring is parallel to that of the cathode ring. The focused anode layer ion source device is scientific and reasonable in structure design; the anode ring and the cathode ring are set to be parallel circular conical surfaces, generated ion beams are focused towards the axis direction and the ion beams of which the sections are solid circles are formed within a distance range far away from the focusing point; the ion beam density is concentrated and the section uniformity is good; through a design of multiple groups of water-cooling systems, the cooling effect on a magnetic path and the inner cathode ring is ensured; the service life of the inner cathode ring can be prolonged; and the continuous high-intensity working time of the ion source is prolonged and the reliability of the ion source is strengthened.

Description

technical field [0001] The invention relates to the technical field of ion sources, in particular to a focusing type anode layer ion source device. Background technique [0002] The linear ion source was first successfully developed by Russian researchers. In the 1990s, the American AE company obtained the design principle of this technology and conducted in-depth research and product development, which not only greatly improved the linear ion source in terms of working performance. Great improvement, but also launched a number of series of improved products, such as basic type, multi-unit type and linear ion source and so on. This type of ion source has achieved great success in ion beam etching and cleaning of substrates, assisted thin film deposition and direct thin film deposition. However, the ion beams generated by this type of ion source are parallel. When the ion beam needs to be focused, this type of ion source is powerless. At the same time, in the prior art, the ...

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Problems solved by technology

However, the ion beams generated by this type of ion source are parallel. When the ion beam needs to be focused, this type of ion source is powerless. At the same time, in the prior art, the ion source device usually only uses a single water cooling method to cool the device. Limited, which greatly affects the life and effectiveness of the ion source

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