Mold for step-and-repeat imprinting, and method for producing same
A mold and area technology, applied in the field of step-and-repeat imprint molds and their manufacturing, can solve the problems of expensive, time-consuming, and difficult to achieve large-scale molds
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no. 1 Embodiment approach
[0027] Such as figure 1 As shown, the step-and-repeat imprint mold 2 according to the first embodiment of the present invention includes: a transparent base material 4; 13. A light-shielding member 5 provided between the transparent substrate 4 and the transparent resin layer 6 so as to overlap the concave-convex pattern 3 at the end of the pattern region 13 .
[0028] Hereinafter, each constituent element will be described in detail.
[0029] 1. Configuration of mold 2 for imprinting
[0030] (1) Transparent substrate 4
[0031] The transparent substrate 4 is a substrate formed of a transparent material such as a resin substrate, a quartz substrate, or a silicone substrate. For the formation of a flexible resin mold, a resin base material is preferred, specifically, for example, selected from polyethylene terephthalate, polycarbonate, polyester, polyolefin, polyimide, polysulfone , polyethersulfone, cyclic polyolefin, and polyethylene naphthalate.
[0032] (2) Transparen...
no. 2 Embodiment approach
[0057] use Figure 4 The step-and-repeat imprint mold 2 according to the second embodiment of the present invention will be described.
[0058] In the first embodiment, the light shielding member 5 is provided so as to overlap the pattern region 13 only at the end of the pattern region 13, but in this embodiment, as Figure 4 As shown, the light shielding member 5 is also provided at a location other than the end of the pattern area 13 . According to such a composition, as Figure 4 As shown, the area covered by the light-shielding member 5 arranged at the end of the pattern area 13 becomes the end portion light-shielding area S1, and the area covered by the light-shielding member 5 arranged at other than the end of the pattern area 13 becomes the non-end portion light-shielding area S2. , and the remaining area becomes the transparent area T. Such a configuration can also suppress deformation of the reversed pattern 3 r of the cured resin layer 19 .
no. 3 Embodiment approach
[0060] use Figure 5 ~ Figure 6 The step-and-repeat imprint mold 2 according to the third embodiment of the present invention will be described.
[0061] In this embodiment, if Figure 5 As shown, the light shielding member 5 is not provided at the end of the pattern area 13 but is provided only at a portion other than the end of the pattern area 13 . For example Image 6 As shown, the mold 2 having such a configuration can be used in a state held by the holding portion 21 of the imprint device so that the outer region of the light shielding member 5 is not irradiated with the active energy rays 19 . According to such a usage method, the area covered by the light shielding member 5 closest to the end of the pattern area 13 becomes the end portion light shielding area S1, the other areas covered by the light shielding member 5 become the non-end portion light shielding area S2, and the remaining areas It becomes the light-transmitting region T. Therefore, similarly to the s...
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Abstract
Description
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