Unlock instant, AI-driven research and patent intelligence for your innovation.

Silver etching liquid composition and display substrate therewith

A technology of display substrate and composition, applied in the field of silver etching solution composition and display substrate using the same, can solve the problems of difficult formation of taper angle, difficulty in use and the like

Inactive Publication Date: 2017-05-17
DONGWOO FINE CHEM CO LTD
View PDF6 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, SO used as an auxiliary oxide dissolver 4 2- The presence of the compound reacts with silver (Ag) to form silver sulfide (Ag 2 The defect that the form of S) remains as a residue in the substrate, ClO 4 - Compounds are now regulated as environmental control substances, and there are difficulties in use
In addition, when using the composition to etch a metal film containing silver, there is still the problem that the formation of the taper angle after etching is difficult.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Silver etching liquid composition and display substrate therewith
  • Silver etching liquid composition and display substrate therewith
  • Silver etching liquid composition and display substrate therewith

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1～11 and comparative example 1～8

[0070] The components described in the following Table 1 were mixed at this content to manufacture a silver etchant composition. (unit weight%)

[0071] 【Table 1】

[0072]

[0073] MTZ: methyl tetrazole

[0074] ATZ: Aminotetrazole

experiment example 1

[0075] Experimental example 1. Performance test of silver etchant composition

[0076] An organic insulating film was vapor-deposited on a substrate, and an Ag single film was vapor-deposited thereon, and cut into 300×300 mm with a diamond cutter to prepare a test piece.

[0077] Using the silver etchant compositions of Examples 1 to 11 and Comparative Examples 1 to 8, the following performance tests were performed.

[0078] 1. Measurement of single-side etching distance (S / E, Side Etch) of wiring (or reflective film)

[0079] In the experimental equipment (model name: ETCHER (TFT), K.C.Tech company) of jet etching mode, pack the silver etchant composition of above-mentioned embodiment 1~11 and comparative example 1~8 respectively, the temperature is set to 40 °C, after heating up, when the temperature reached 40±0.1°C, the above-mentioned etching process of the test piece was performed. The total etching time was set to 60 seconds and implemented.

[0080] Put the substr...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a silver etching liquid composition comprising, by weight, 30-60% of H3PO4, 0.5-10% of HNO3, 33-50% of acetic acid, 0.01-10% of an azole compound, and the balanced being deionized water, so that the total weight of the composition is 100%.

Description

technical field [0001] The present invention relates to a silver etchant composition and a display substrate using the same. More specifically, it relates to a composition containing 30 to 60% by weight of phosphoric acid, 0.5 to 10% by weight of nitric acid, and 33 to 50% by weight of acetic acid relative to the total weight of the composition. %, 0.01 to 10% by weight of an azole compound, and the balance of deionized water so that the total weight of the composition becomes 100% by weight of a silver etchant composition and a display substrate using the same. Background technique [0002] With the advent of the true information age, the field of displays for processing and displaying a large amount of information is rapidly developing, and various flat panel displays have been developed correspondingly, attracting attention. [0003] Examples of such flat panel display devices include liquid crystal display devices (Liquid Crystal Display device: LCD), plasma display devi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/30
CPCC23F1/30
Inventor 沈庆辅安基熏李承洙朴英哲李钟文张晌勋
Owner DONGWOO FINE CHEM CO LTD