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A DC Photocathode Ultrafast Electron Gun

An electron gun and photocathode technology, applied in the direction of discharge tube electron guns, circuits, electrical components, etc., can solve the problems of electron gun damage, affecting the work of surrounding electronic products, damage to electronic products, etc., to eliminate tip discharge, shield external interference, and improve stability. sexual effect

Active Publication Date: 2018-06-01
INST OF PHYSICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] When the electron gun is working, there will be discharge occasionally, and the excessive short-circuit current in the discharge will not only cause damage to the electron gun, but also affect the work of surrounding electronic products through the ground wire.
In addition, the process is often accompanied by electromagnetic radiation, which can also cause damage to electronic products

Method used

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  • A DC Photocathode Ultrafast Electron Gun
  • A DC Photocathode Ultrafast Electron Gun
  • A DC Photocathode Ultrafast Electron Gun

Examples

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Embodiment Construction

[0031] In order to make the objectives, technical solutions and advantages of the present invention clearer and clearer, the present invention will be further described in detail below through specific embodiments in conjunction with the accompanying drawings. In each of the drawings, the same reference numerals represent the same components. It should be understood that the specific embodiments described herein are only used to explain the present invention, but not to limit the present invention.

[0032] figure 1 It is an exploded perspective view of the electron gun according to the embodiment of the present invention. figure 2 For the edge figure 1 The basis for intercepting the central axis AA’ figure 1 Cross-sectional view of the electron gun of the embodiment. Along the propagation direction of the incident laser, the electron gun mainly includes an incident sapphire window 10, an electron gun base 9, a ceramic column 8, a cathode base 7, a cathode 6, a lens 5, a hollow d...

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Abstract

The invention provides a photocathode ultrafast electron gun wherein the cathode is of an axis-symmetrical structure and comprises a first cylindrical side face, a round bottom face and a first connection face to have the first cylindrical side face connected with the round bottom face. The center of the round bottom face is provided with a light penetration hole. The outer side of the round bottom face is provided with a round groove to hold a metal film. The anode is of an axis-symmetrical structure and comprises a round top face, a second cylindrical side face, a round bottom face and a second connection face to have the round top face and the second cylindrical side face connected. The round bottom face extends outwardly in the radius direction of the lower edge of the second cylindrical side face. The center of the round top face is provided with a through hole and the first connection face is provided with a round chamfer angle, and the second connection face is provided with an elliptical chamfer angle.

Description

Technical field [0001] The invention belongs to the field of photocathode electron guns, and particularly relates to a direct current photocathode ultrafast electron gun. Background technique [0002] The photocathode electron gun is a device that excites the cathode material by laser, the generated photoelectrons are accelerated by the high voltage applied between the anode and the anode, and then the generated high-energy electrons are used for sample detection. The electron beam has a certain energy, a certain beam current, speed and angle. Due to the existence of the spatial repulsion of electrons, the electron beam will be broadened as it drifts to the sample, resulting in a decrease in the time resolution of the electron beam. Due to the relativistic effect, the high-energy electron beam can effectively weaken the Coulomb broadening effect. In addition, the photoelectron exiting the cathode also needs to overcome the attraction of the image charge. For an electron beam wi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J3/02
CPCH01J3/021H01J3/026H01J3/027
Inventor 李玉同李梦超王瑄
Owner INST OF PHYSICS - CHINESE ACAD OF SCI
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