Horizontal quartz boat cleaning machine and cleaning method

A technology for quartz boats and cleaning machines, applied in cleaning methods and utensils, cleaning methods using liquids, chemical instruments and methods, etc., can solve the problems of difficulty in controlling the rotation speed, material loss, and easily damaged quartz boats, and achieve savings. Cost recovery, waste reduction, stable cleaning effect

Inactive Publication Date: 2017-06-13
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
View PDF10 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In the above-mentioned utility model patent, the purpose of cleaning the quartz boat is achieved by directly rotating the quartz boat in the cleaning tank. However, this is not only easy to damage the quartz boat, but also produces a certain amount of material in the quartz boat itself after each diffusion process. Loss, which brings certain challenges to the clamping safety of the adapter that fixes the quartz boat, and its rotation speed is also difficult to control

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Horizontal quartz boat cleaning machine and cleaning method
  • Horizontal quartz boat cleaning machine and cleaning method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0047] The specific embodiment of the present invention will be further described in detail below in conjunction with the accompanying drawings.

[0048] It should be noted that, in the following specific embodiments, when describing the embodiments of the present invention in detail, in order to clearly show the structure of the present invention for the convenience of description, the structures in the drawings are not drawn according to the general scale, and are drawn Partial magnification, deformation and simplification are included, therefore, it should be avoided to be interpreted as a limitation of the present invention.

[0049] In the following specific embodiments of the present invention, please refer to figure 1 , figure 1 It is a structural schematic diagram of a horizontal quartz boat cleaning machine in a preferred embodiment of the present invention. like figure 1 As shown, a kind of horizontal quartz boat cleaning machine of the present invention can inclu...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a horizontal quartz boat cleaning machine and a cleaning method. A quartz boat is carried by a flower basket, repeated lifting or / and horizontal motion are performed under the drive of a manipulator to stir a cleaning liquid in an ultrapure water process tank and a chemical process tank, so that effective vibration cleaning can be performed on the quartz boat and can be accompanied with overflow and air-blowing cleaning processes, and automatic, comprehensive and stable cleaning of the quartz boat is realized; meanwhile, an outer ultrapure water process tank is arranged on the periphery of the ultrapure water process tank, an outer chemical process tank is arranged on the periphery of the chemical process tank, waste liquids in the ultrapure water process tank, the outer ultrapure water process tank, the chemical process tank and the outer chemical process tank can be discharged and recovered in a classified manner by use of a pipeline system, thus, a large quantity of the waste liquids during waste liquid treatment are reduced, and the recovery cost is saved.

Description

technical field [0001] The invention relates to the technical field of semiconductor cleaning equipment, and more specifically, to a horizontal quartz boat cleaning machine and a cleaning method for cleaning a quartz boat using the horizontal quartz boat cleaning machine. Background technique [0002] The silicon wafer diffusion process is to insert the silicon wafer on the quartz boat, then put the quartz boat and the silicon wafer into the quartz tube, and put them into the high-temperature diffusion furnace together, and then pass a certain amount of diffusion source into the tail of the furnace tube. The gas, under high temperature conditions, chemically reacts with the silicon wafer through the diffusion source gas to complete the diffusion process. [0003] After each diffusion process, a certain amount of diffused particles will remain on the surface of the quartz boat, and the quartz boat is in direct contact with the silicon wafer. Therefore, the cleanliness of the ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/10B08B3/08B08B3/04B08B3/14
CPCB08B3/102B08B3/048B08B3/08B08B3/14
Inventor 李广义张豹王锐廷
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap