Horizontal quartz boat cleaning machine and cleaning method

Abstract

The invention discloses a horizontal quartz boat cleaning machine and a cleaning method. A quartz boat is carried by a flower basket, repeated lifting or / and horizontal motion are performed under the drive of a manipulator to stir a cleaning liquid in an ultrapure water process tank and a chemical process tank, so that effective vibration cleaning can be performed on the quartz boat and can be accompanied with overflow and air-blowing cleaning processes, and automatic, comprehensive and stable cleaning of the quartz boat is realized; meanwhile, an outer ultrapure water process tank is arranged on the periphery of the ultrapure water process tank, an outer chemical process tank is arranged on the periphery of the chemical process tank, waste liquids in the ultrapure water process tank, the outer ultrapure water process tank, the chemical process tank and the outer chemical process tank can be discharged and recovered in a classified manner by use of a pipeline system, thus, a large quantity of the waste liquids during waste liquid treatment are reduced, and the recovery cost is saved.

Description

technical field [0001] The invention relates to the technical field of semiconductor cleaning equipment, and more specifically, to a horizontal quartz boat cleaning machine and a cleaning method for cleaning a quartz boat using the horizontal quartz boat cleaning machine. Background technique [0002] The silicon wafer diffusion process is to insert the silicon wafer on the quartz boat, then put the quartz boat and the silicon wafer into the quartz tube, and put them into the high-temperature diffusion furnace together, and then pass a certain amount of diffusion source into the tail of the furnace tube. The gas, under high temperature conditions, chemically reacts with the silicon wafer through the diffusion source gas to complete the diffusion process. [0003] After each diffusion process, a certain amount of diffused particles will remain on the surface of the quartz boat, and the quartz boat is in direct contact with the silicon wafer. Therefore, the cleanliness of the ...

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Problems solved by technology

[0006] In the above-mentioned utility model patent, the purpose of cleaning the quartz boat is achieved by directly rotating the quartz boat in the cleaning tank. However, this is not only easy to damage the quartz boat, but also produces a certain amount of material in the quartz boat itself after each diffusion process. Loss, which brings certain challenges to the clamping safety of the adapter that fixes the quartz boat, and its rotation speed is also difficult to control

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