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Closed channel reaction tank system with deflector

A technology of reaction tank and guide plate, applied in the field of reaction tank system, can solve the problems of waste of precursor process cost, difficulty in achieving uniform coating film, uneven transmission of precursor, etc., and achieves improvement of diffusion efficiency and rapid growth of film. Effects of rate, shortening pulse time, increasing reactivity

Active Publication Date: 2019-09-27
彭宗平
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  • Abstract
  • Description
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Problems solved by technology

[0004] In other words, it is difficult for the traditional ALD system in the prior art to achieve a uniform coating film on nanostructured substrates with high aspect ratios, and most precursors cannot diffuse into the nanostructured substrate, resulting in uneven transmission of precursors Sexuality and waste of precursors cause the problem of rising process costs

Method used

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  • Closed channel reaction tank system with deflector
  • Closed channel reaction tank system with deflector
  • Closed channel reaction tank system with deflector

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Embodiment Construction

[0063] The implementation of the present invention is described below through specific specific examples, and those who are familiar with this technology can easily understand other advantages and effects of the present invention from the content disclosed in this description, and can also be implemented through other different specific examples or apply. Thus, the following invention encompasses that any feature of any particular embodiment disclosed herein may be combined with any feature of any other embodiment disclosed herein.

[0064] It should be noted that the structures, proportions, sizes, etc. shown in the drawings attached to this specification are only used to match the content disclosed in the specification, for the understanding and reading of those familiar with this technology, and are not used to limit the implementation of the present invention Therefore, it has no technical substantive meaning. Any modification of structure, change of proportional relations...

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Abstract

The invention relates to a closed runner reaction tank system with a flow guide plate. The closed runner reaction tank system comprises a reaction tank main body, an upper sealing cover, a lower sealing cover and at least one flow guide plate, wherein a plurality of closed runners are arranged in the reaction tank main body; the upper sealing cover and the lower sealing cover are respectively arranged at the two ends of the reaction tank main body; an inlet end and an outlet end are respectively formed on the upper sealing cover and the lower sealing cover so as to connect the closed runners; the flow guide plate is arranged between the upper sealing cover and the reaction tank main body and is used for uniformly guiding the precursor injected from the inlet end of the upper sealing cover into the closed runners.

Description

technical field [0001] The present invention relates to a reaction tank system for chemical vapor phase reaction, in particular to a closed channel reaction tank system with deflectors using atomic layer deposition (Atomic layer deposition, ALD) technology. Background technique [0002] In order to increase the chemical reaction rate in the industry, catalytic materials are often added in the production process to promote the reaction rate and increase the output. In a reaction process, the condition that is positively related to the chemical reaction rate is the contact area between the catalyst and the reactant. Therefore, the particle size of the catalyst used today is mostly nano-scale to increase the reaction area. [0003] In addition, in the technical field of atomic layer deposition (ALD), traditional ALD systems can be divided into vertical-flow reactors and cross-flow reactors according to the direction of gas flow. However, the process equipment of this tradition...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01J19/00
Inventor 彭宗平柯志忠林建宝蜜西菈黄圣鑫刘光益余友轩
Owner 彭宗平
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