Unlock instant, AI-driven research and patent intelligence for your innovation.

Rapid polishing device

A kind of equipment and fast technology, which is applied in the direction of grinding/polishing equipment, metal processing equipment, grinding machines, etc., can solve the problems of uneven wax surface, low polishing efficiency of wax surface, and can not be covered at one time, so as to achieve uniform structure Simple, efficient sanding results

Inactive Publication Date: 2017-06-27
湖州裕尚卫浴有限公司
View PDF1 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to overcome the shortcomings of the prior art and overcome the problems of low wax surface polishing efficiency, inability to cover at one time during the polishing process, and uneven wax surface caused by back and forth grinding

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Rapid polishing device
  • Rapid polishing device
  • Rapid polishing device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] figure 1 Schematic diagram of the rapid grinding equipment, figure 2 It is a schematic diagram of the top view of the rapid grinding equipment, image 3 It is a schematic diagram of the structure of the fast grinding equipment when the material is turned to the discharge mechanism, Figure 4 It is a schematic diagram of the front view of part of the structure of the rapid grinding equipment, Figure 5 An enlarged schematic diagram of part of the structure of the rapid grinding equipment, Image 6 Schematic diagram of the supporting frame structure. Such as figure 1 , figure 2 , image 3 , Figure 4 , Figure 5 and Image 6 As shown, a kind of rapid grinding equipment comprises a feeding mechanism 1, the feeding mechanism 1 includes a support plate 11 and a rotating device 12 for driving the material to rotate along the surface of the support plate 11; a grinding mechanism 2, the grinding mechanism 2 includes The clamping device 21 for compressing and limitin...

Embodiment 2

[0045] Such as figure 1 , figure 2 , image 3 , Figure 4 , Figure 5 with Image 6 As shown, the components that are the same as or corresponding to those in the first embodiment are marked with the corresponding reference numerals in the first embodiment. For the sake of simplicity, only the differences from the first embodiment will be described below. The difference between the second embodiment and the first embodiment is that it also includes a waste collection part 4, and the waste collection part 4 includes a waste brush 41 arranged above the turntable 331 and sliding relative to the turntable 331, and a waste brush 41 arranged on the turntable 331 The waste material outlet 42 on one side of the waste material brush 41 ; the waste material brush 41 is fixed on the support plate 11 through a fixed rod 43 , and the waste brush 41 is detachably connected to one end of the fixed rod 43 .

[0046] The grinding mechanism 2 will produce waste materials during the grindi...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a rapid polishing device, comprising a feeding mechanism, a polishing mechanism and a discharging mechanism; the feeding mechanism comprises a support disk and a rotary device used for driving materials to rotate along the surface of the support disk; the polishing mechanism comprises a clamping device for compressing and limiting the materials driven by the rotary device and a polishing device arranged below the clamping device and used for polishing lower surfaces of the materials; a polishing passage is formed between the clamping device and the support disk, and the height of the polishing passage equals to the thickness of the materials; and the discharging mechanism comprises a discharging hole arranged in the rear end of the polishing mechanism, a discharging device arranged above the discharging hole and used for guiding the materials to the lower part and an output device arranged below the support disk. The rapid polishing device overcomes the problems of low polishing efficiency of a wax surface, incapability of covering for one time in a polishing process and an uneven wax surface caused by polishing back and forth.

Description

technical field [0001] The invention relates to the field of polishing equipment, in particular to a fast polishing equipment. Background technique [0002] Ceramic tile is the material used for laying walls and floors in many families. After the tiles are waxed, the film formed by waxing can prevent moisture and dust, and at the same time enhance the aesthetics of the tiles. Existing waxing on tiles is mainly done manually. There is a disadvantage of uneven waxing and the wax surface needs to be polished. The existing ones also manually polish the wax surface a little bit, which is low in efficiency and the polishing effect is not good. Well, the strength is difficult to control, so it is necessary to design a ceramic tile wax surface polishing equipment. [0003] A Chinese invention patent with the application number of 201420303765.8 discloses a special waxing and polishing machine for furniture. It sets two sets of polishing disk mechanisms and four sets of transverse ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B24B19/22B24B41/00B24B41/06B24B27/00
CPCB24B19/22B24B27/0069B24B41/002B24B41/005B24B41/06
Inventor 陆惠明
Owner 湖州裕尚卫浴有限公司