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Metal Mask Materials and Metal Masks

A metal mask and alloy technology, which is applied in the field of metal mask materials and metal masks, can solve the problems of opening shape deformation, strength reduction, etc., achieve good precision, and improve the effect of etching processing precision

Active Publication Date: 2019-04-02
JX NIPPON MINING & METALS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] However, if the patterning of the metal mask becomes finer, the mask portion sandwiched between the openings of the mask becomes thinner, the strength decreases, and there is a risk that the shape of the opening will be deformed due to bending.

Method used

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  • Metal Mask Materials and Metal Masks
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Examples

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Effect test

Embodiment

[0066] Hereinafter, examples of the present invention are shown, but these examples are provided for better understanding of the present invention and are not intended to limit the present invention.

[0067] (1) Manufacture of metal mask materials

[0068] A raw material obtained by adding 36% by mass of Ni to Fe was melted and produced by vacuum induction melting, and an ingot having a thickness of 50 mm was cast. It is hot-rolled to 8mm, after grinding to remove the oxide film on the surface, cold rolling and annealing are repeated to make cold-rolled material, and then, under the conditions shown in Table 1, intermediate recrystallization annealing, intermediate cold rolling, In the process of final recrystallization annealing and finish cold rolling, the metal mask materials of the product thicknesses of Examples 1 to 8 and Comparative Examples 1 to 4 in Table 1 were finished. Furthermore, stress relief annealing was performed at 300° C. for 12 hours. In addition, as Ex...

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Abstract

Provided are a metal mask material and a metal mask capable of improving etching processing accuracy and capable of detecting inherent defects with good precision. A metal mask material formed of a rolled sheet of a Fe-Ni-based alloy containing a total of 30 to 45% by mass of Ni and Co, containing 0 to 6% by mass of Co , and the remaining part is composed of Fe and unavoidable impurities, the thickness t is greater than 0.08mm, and the arithmetic mean roughness Ra measured according to JIS-B0601 in the parallel direction of rolling and the vertical direction of rolling is 0.01~0.20μm, and, along the rolling direction The 60-degree gloss G60 measured in the parallel direction and rolling vertical direction according to JIS-Z8741 is 200~600.

Description

technical field [0001] The present invention relates to a metal mask material and a metal mask used in the manufacture of organic EL displays and the like. Background technique [0002] Among flat panel displays, organic EL displays have the following characteristics compared with current mainstream liquid crystal displays: the product can be made thinner due to its simple structure; fast-changing images can be displayed smoothly; and the viewing angle is wide. This organic EL display has already been mass-produced in small devices such as portable terminals, and as the main force of next-generation displays, it is being promoted for practical use in large-scale displays. [0003] Methods for producing an EL (light emitting) layer of an organic EL display are broadly classified into a vapor deposition method and a printing method. The vapor deposition method is a method of attaching an EL substance heated and evaporated in a vacuum to the surface of a substrate in a thin la...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/04H01L51/56
CPCC23C14/0021C23C14/044H10K71/166H10K71/00C22C38/105C23C14/042
Inventor 近藤祐幸
Owner JX NIPPON MINING & METALS CORP
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