Supercharge Your Innovation With Domain-Expert AI Agents!

Adjusting method for imprint apparatus, imprinting method, and article manufacturing method

An adjustment method and a technology for adjustment steps, which are applied in the fields of adjustment of imprinting devices, imprinting, and article manufacturing, and can solve the problems of expensive molds, mold deterioration, damage, etc.

Active Publication Date: 2017-07-04
CANON KK
View PDF7 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in imprinting for adjustment, if the pressing force against the substrate is strong or there are particles between the substrate and the mold, the mold may deteriorate or be damaged
Pattern dies are very expensive

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Adjusting method for imprint apparatus, imprinting method, and article manufacturing method
  • Adjusting method for imprint apparatus, imprinting method, and article manufacturing method
  • Adjusting method for imprint apparatus, imprinting method, and article manufacturing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0016] Hereinafter, exemplary embodiments of the present disclosure will be described with reference to the accompanying drawings.

[0017] figure 1 The structure of the imprint apparatus 100 according to the embodiment of the present disclosure is schematically shown. The imprint apparatus 100 shapes an imprint material supplied on a substrate S using a mold (pattern model) PM, and forms a pattern on the substrate S by curing the shaped imprint material. Imprint materials are curable compositions that are cured by providing energy for curing the material. The imprint material can be in a cured or uncured state. The energy used for curing may be, for example, electromagnetic waves, heat, and the like. For example, the electromagnetic wave may be light (for example, infrared light, visible light, or ultraviolet light) whose wavelength is selected within a range of equal to or greater than 10 nm to less than or equal to 1 mm.

[0018] Typically, curable compositions are cure...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

An adjusting method for adjusting an imprint apparatus includes a preparation step of preparing a sample for evaluating a state in which a contact region of a test mold is in contact with an imprint material supplied on a substrate; an evaluation step of evaluating the sample; and an adjustment step of adjusting the imprint apparatus based on a result of evaluation obtained in the evaluation step. The contact region includes a flat region which does not include a pattern, the evaluation in the evaluation step includes a first evaluation, which is an evaluation of a state of the imprint material in the flat region, and the imprint apparatus is adjusted based on a result of the first evaluation in the adjustment step.

Description

technical field [0001] The present disclosure generally relates to a method of adjusting a stamping device, a stamping method, and a method of manufacturing an article. Background technique [0002] The imprint technique is a technique for arranging an imprint material on a substrate, shaping the imprint material using a mold, and then curing the imprint material to transfer the pattern of the mold to the imprint material. Forming of the imprint material is performed by bringing the mold into contact with the imprint material to fill the imprint material in the recesses constituting the pattern of the mold by capillarity. In order to form a pattern without any defect on a substrate by imprinting technology, it is necessary to adjust the imprinting device. Hereinafter, forming a pattern on a substrate by an imprinting technique will be referred to as imprinting. The adjustment of the imprint apparatus may include, for example, adjustment of imprint conditions in the imprint...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00
CPCG03F7/0002G03F9/7042G05B19/41875G05B2219/32182G05B2219/45031Y02P90/02G03F7/7085G03F7/7065G03F7/70933G03F7/7035G03F7/706833G03F7/70516G03F9/7046G03F7/70683G03F9/7019B05D3/06B05D3/12G05B19/418
Inventor 浅田邦彦石田晋吾笹健太
Owner CANON KK
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com