On-line image analysis-based focusing method of laser direct writing system

A technology of laser direct writing and focusing method, which is applied to the photoplate making process, optics, and optomechanical equipment of the patterned surface, which can solve the problems of limiting the material range and damage of the laser direct writing system, and achieve the improvement of writing quality and yield , reduce damage, widen the effect of the range

Active Publication Date: 2017-07-21
SUZHOU HUAWEINA NANO SCI & TECH
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Problems solved by technology

However, the above method is difficult to adapt to the situation that there are impurities on the sample surface and the reflectivity of the sample surface is quite different; moreover, the astigmatism method needs to turn on the focused light source for a long time, which is easy to cause damage to some sensitive writing samples; therefore, it limits The range of materials that can be processed by the laser direct writing system

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  • On-line image analysis-based focusing method of laser direct writing system
  • On-line image analysis-based focusing method of laser direct writing system
  • On-line image analysis-based focusing method of laser direct writing system

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Embodiment Construction

[0028] The present invention will be described in further detail below in conjunction with the accompanying drawings and embodiments.

[0029] A focusing method of a laser direct writing system based on online image analysis, the laser direct writing system includes an objective lens and a camera, and the focusing method includes the following steps:

[0030] 1) Fix the Sn film sample with a thickness of 40nm on the glass substrate, and set the height of the objective lens to a certain value Z near the target height through rough focus adjustment i , where Z i is 52 μm; turn on the LED lighting source, turn off the focusing light source, and collect the image of the sample surface through the camera; the image at this time has only the background and no focus spot, which is called the background image; figure 1 shown. Coarse focusing uses precision threaded electric nuts, or piezoelectric ceramics, or linear motors to drive the sample or objective lens to move so that the re...

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Abstract

The invention relates to an on-line analysis-based focusing method of a laser direct writing system. The focusing method comprises the following steps of setting an initial height of an objective lens by roughly focusing, respectively acquiring a background image and an information source image by a camera, and determining a focusing light spot size corresponding to the height of the objective lens by an automatically-designed image analysis algorithm; upwards and downwards moving the objective lens to different height values, acquiring a series of light spot sizes, and fitting a straight line or a curve by a preset algorithm; and acquiring the light spot size corresponding to an optimal inscribing effect, analyzing the fitting straight line or the curve to obtain a target height of the objective lens, outputting the target height to an executor, and completing focusing. By the focusing method, the interference of sample surface impurity and reflectivity on focusing can be effectively eliminated, and the focusing accuracy is maintained within 100 nanometers; and the focusing method has the advantage of fast focusing speed, the damage of focusing light to a sensitive sample can be substantially reduced, so that the range of a material which can be processed by the laser direct writing system is greatly expanded, and the inscribing quality and the finished rate are improved.

Description

technical field [0001] The invention relates to a laser direct writing system in micro-nano processing technology, in particular to a focusing method of a laser direct writing system based on online image analysis. Background technique [0002] Micro-nano-fabrication is a general term for the processing technology for manufacturing micro-scale and nano-scale microstructures. The size of structures from a few nanometers to 100 μm belongs to the range of micro-nano-processing. With the increasing demand for small batches and customization of optoelectronic devices, semiconductor devices, and microelectromechanical devices, direct-write micro-nano processing equipment with high resolution, high production efficiency, low environmental requirements, and compatibility with multi-receptor materials is becoming more and more popular. more people's attention. [0003] At present, there are three mainstream direct-writing micro-nano processing methods: electron beam lithography, foc...

Claims

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Application Information

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IPC IPC(8): G03F7/20
CPCG03F7/2053G03F7/70383
Inventor 刘前王闯
Owner SUZHOU HUAWEINA NANO SCI & TECH
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