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Lithography method

A lithography, photoresist technology, applied in photography, microlithography exposure equipment, instruments, etc., can solve problems such as incomplete compliance

Inactive Publication Date: 2017-08-15
TAIWAN SEMICON MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although existing lithography methods are generally suitable for the purpose of their development, they still do not fully meet the needs of all aspects

Method used

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  • Lithography method
  • Lithography method
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Embodiment Construction

[0035] Different embodiments or examples provided below may implement different structures of the present disclosure. The examples of specific components and arrangements are used to simplify the disclosure and not to limit it. For example, the statement that the first component is formed on the second component includes that the two are in direct contact, or there are other additional components interposed between the two instead of direct contact. In addition, numbers may be repeated in various examples of the present disclosure, but these repetitions are only for simplification and clarity of illustration, and do not mean that units with the same numbers in different embodiments and / or arrangements have the same corresponding relationship.

[0036] In addition, spatial relative terms such as "beneath", "beneath", "below", "above", "above", or similar terms may be used to simplify the relationship between one element and another element in the illustrations. relative relati...

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Abstract

Methods and materials for making a semiconductor device are described. The method includes forming a photoresist over a substrate. The photoresist includes an acid-labile group (ALG) connected to a polar unit. The method also includes exposing the photoresist to a radiation beam, baking the photoresist and performing a developing process to the photoresist.

Description

technical field [0001] The present disclosure relates to semiconductor processing, and more particularly to lithography methods. Background technique [0002] The semiconductor integrated circuit (IC) industry has experienced rapid growth for some time. Technological advances in IC materials, design, and process tools have resulted in each generation of ICs having smaller and more complex circuits than the previous generation. In these developments, process methods, tools, and materials are striving to meet the demands of smaller structure sizes. [0003] The lithography mechanism is to project a pattern onto a substrate, such as a semiconductor wafer, which has a photosensitive layer formed thereon. The pattern is typically defined by rays passing through the patterned photomask. Lithography tools and methods have made significant progress in reducing the line width of image elements. Although existing lithography methods are generally suitable for the purpose for which...

Claims

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Application Information

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IPC IPC(8): G03F7/20G03F7/34
CPCG03F7/20G03F7/34G03F7/70G03F7/0392G03F7/0397G03F7/038G03F7/0382G03F7/0045G03F7/325G03F7/38
Inventor 訾安仁张庆裕
Owner TAIWAN SEMICON MFG CO LTD