Stereolithographic method and composition

A technology of stereolithography and composition, applied in optics, manufacturing tools, dental prosthesis, etc., can solve the problems of high viscosity of resin composition, decline of molding precision and operability, insufficient balance of mechanical strength and toughness, etc. , to achieve the effect of improving performance and improving mechanical properties

Inactive Publication Date: 2017-08-18
DWS SRL
View PDF17 Cites 16 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this method has the following disadvantages: since the viscosity of the resin composition becomes high due to mixing with rubber polymer particles in the photocurable resin, the molding accuracy and workability decrease
Further, in order to obtain high toughness and improved tensile elongation, urethane acrylate resins (JP 61-185522) containing caprolactone units are known, but tensile elongation, mechanical strength Balance with resilience is still considered insufficient

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Stereolithographic method and composition
  • Stereolithographic method and composition
  • Stereolithographic method and composition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0154] (1) Mix 10.0 g of a mixture of a crosslinkable oligomer and a methacryloyl-modified polyrotaxane (“SeRM Key Mixture SM1310C” manufactured by Advanced Softmaterials), 80.0 g of 1 mol 2 , urethane dimethacrylate obtained by the reaction of 2,4-trimethylhexamethylene diisocyanate and 2 mol of 2-hydroxyethyl methacrylate ("U-2TH", Shin Nakamura Chemical (Shin Nakamura Chemical) Co., Ltd.) (expressed as the formula "CH 2 =C(CH 3 )-CO-O-CH 2 CH 2 -O-CO-NH-[CH 2 C(CH 3 ) 2 CH 2 CH(CH 3 )CH 2 CH 2 ]-NH-CO-O-CH 2 CH 2 -O-CO-(CH 3 )C=CH 2 ”), 20 g of triethylene glycol dimethacrylate (“NK-3G”, manufactured by ShinNakamura Chemical Co., Ltd.), and 1.1 g of 2,4,6-trimethylbenzoyl dimethacrylate Phenylphosphine oxide ("Irgacure TPO", photosensitive radical polymerization initiator, manufactured by BASF Corporation), followed by stirring to prepare a liquid photocurable resin composition. Using a B-type viscometer ("DV-E", Brookfield Engineering Laboratories, Inc.), th...

Embodiment 2

[0159] (1) 20.0 g of a mixture of a crosslinkable oligomer and a methacryloyl-modified polyrotaxane (“SeRM Key Mixture SM1310C” manufactured by Advanced Softmaterials), 80.0 g of 1mol 2 , a urethane dimethacrylate obtained by the reaction of 2,4-trimethylhexamethylene diisocyanate and 2 mol of hydroxyethyl methacrylate ("U-2TH", Shin Nakamura Chemical) Co., Ltd.) (which is represented by the formula "CH 2 =C(CH 3 )-CO-O-CH 2 CH 2 -O-CO-NH-[CH 2 C(CH 3 ) 2 CH 2 CH(CH 3 )CH 2 CH 2 ]-NH-CO-O-CH 2 CH 2 -O-CO-(CH 3 )C=CH 2 ”), 20 g of triethylene glycol dimethacrylate (“NK-3G”, manufactured by ShinNakamura Chemical Co., Ltd.), and 1.2 g of 2,4,6-trimethylbenzoyl Diphenylphosphine oxide ("Irgacure TPO", photosensitive radical polymerization initiator, manufactured by BASF Corporation), followed by stirring to prepare a liquid photocurable resin composition. A B-type viscometer ("DV-E" , manufactured by Brookfield Engineering Laboratories), the viscosity of the photocu...

Embodiment 3

[0162] (1) Mix 10.0 g of a mixture of a crosslinkable oligomer and a methacryloyl-modified polyrotaxane (“SeRM Key Mixture SM1310C” manufactured by Advanced Softmaterials), 80.0 g of 1mol 2 , urethane dimethacrylate obtained by the reaction of 2,4-trimethylhexamethylene diisocyanate and 2 mol of 2-hydroxyethyl methacrylate ("U-2TH", Shin Nakamura Chemical (Shin Nakamura Chemical) Co., Ltd.) (expressed as the formula "CH 2 =C(CH 3 )-CO-O-CH 2 CH 2 -O-CO-NH-[CH 2 C(CH 3 ) 2 CH 2 CH(CH 3 )CH 2 CH 2 ]-NH-CO-O-CH 2 CH 2 -O-CO-(CH 3 )C=CH 2 ”), 20 g of triethylene glycol dimethacrylate (“NK-3G”, manufactured by ShinNakamura Chemical Co., Ltd.), and 1.1 g of 2,4,6-trimethylbenzoyl dimethacrylate Phenylphosphine oxide ("Irgacure TPO", photosensitive radical polymerization initiator, manufactured by BASF Corporation), followed by stirring to prepare a liquid photocurable resin composition, and then the mixture was mixed with 60.0 g of methacrylsilane Treated silica powde...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
viscosityaaaaaaaaaa
Login to view more

Abstract

The invention concerns a method for producing a three-dimensional object, in particular an artificial tooth, by stereolithography wherein a liquid photocurable resin composition is cured by light. Said photocurable resin composition contains, based on the total weight of the photocurable resin composition, (i) from 90 to 99.9% by weight of a radical polymerizable organic compound (A) selected from radical polymerizable monomers, oligomers, pre-polymers and mixtures thereof; and (ii) from 0.1 to 10% by weight of a photosensitive radical polymerization initiator (B). Said radical polymerizable organic compound (A) comprises, based on the weight of the radical polymerizable organic compound (A), from 0.5 to 20% by weight of a polyrotaxane compound comprising a polymer chain selected from polyethylene glycol (PEG), polypropylene glycol (PPG), polyethylene glycol - polypropylene glycol (PEG- PPG) block copolymer or polydimethylsiloxane (PDMS), onto which the cyclodextrin ring(s) is/are slipped and wherein the cyclodextrin is derivatized with at least a radical polymerizable group. The invention also concerns a relative liquid photocurable resin composition and articles produced thereby.

Description

[0001] manual technical field [0002] The present invention relates to a method of manufacturing stereolithography using a photocurable resin composition, said photocurable resin composition, and a three-dimensional object produced thereby, said composition being especially developed for stereolithography. More specifically, the present invention relates to a photocurable composition for stereolithography, a three-dimensional object manufactured therefrom, and a method of manufacturing the object using the photocurable resin composition, with which the composition can be Three-dimensional objects with excellent dimensional accuracy, low volume shrinkage, and further high toughness, high elasticity, and excellent mechanical properties are obtained. Background technique [0003] In general, photocurable liquid resin compositions are widely used in coating materials, photoresists, and dental materials. In recent years, a lamination manufacturing method using a photocurable r...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B29C64/135B33Y70/00B33Y10/00A61C13/00A61K6/09A61K6/884A61K6/893A61K6/896
CPCB33Y10/00B33Y70/00A61C13/0013A61K6/893C08B37/0015G03F7/0037C08L5/16G03F7/027G03F7/0388G03F7/2012B29C64/135A61K6/62A61K6/887C08L75/14A61C13/0004A61C13/087C08G83/007C08L5/00A61K6/898C08F290/062C08F290/068G03F7/029
Inventor 萩原恒夫池谷哲
Owner DWS SRL
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap