The invention discloses a manufacturing method of a three-dimensional gray
scale structure and a three-dimensional micro-nano
structure based on low-
voltage ice gel
electron beam
exposure. The manufacturing method comprises the following steps: depositing an ice layer on a
processing surface; then, low-energy
electron beam layered
exposure is utilized, the ice layer of the specific part of each layer is removed, and finally a three-dimensional gray scale ice sculpture structure with a specific gray scale pattern is formed; selectively depositing a material on the three-dimensional ice sculpture structure by adopting
physical vapor deposition to form a three-dimensional micro-nano structure; the ice layer is
water ice; and the energy of the low-
voltage electron beam is lower than 5keV. According to the method, a three-dimensional ice sculpture structure without a supporting structure can be obtained by utilizing the characteristics of iEBL and low-energy
exposure in
water ice, and gray scale ice sculpture can be successfully converted into a high-purity three-dimensional
metal structure. The breakthrough provides potential for improving
nano device manufacturing by adopting a
water ice resist, and establishes a key technical position of the iEBL in construction of a fine and
pollution-free three-dimensional
metal nano structure.