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Polysilicon production process

A production process, polysilicon technology, applied in silicon and other directions, can solve the problems of high energy consumption, inability to obtain polycrystalline silicon rods, inverted rods, etc., to achieve fast growth rate, reduce the possibility of inverted rods, and reduce the effect of the inverted rod rate.

Active Publication Date: 2021-11-02
巴彦淖尔聚光硅业有限公司
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Problems solved by technology

However, the energy consumption of this production method is relatively high, and during the growth process of silicon rods, the phenomenon of "inverted rods" will occur, and it is impossible to obtain complete polycrystalline silicon rods.

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Embodiment Construction

[0011] Combine below figure 1 and figure 2 The polysilicon production process of the present invention will be described in detail.

[0012] Polysilicon production technique of the present invention comprises the following steps:

[0013] Silicon rod initial growth step. Pass hydrogen and dichlorodihydrogen silicon into the reduction furnace, hydrogen is used as a carrier, and dichlorodihydrogen silicon reacts to deposit polysilicon on the surface of the silicon core. The reaction equation is as follows:

[0014] 2SIH2CL2=SI+SICL4+2H2;

[0015] SIH2CL2=SI+2HCL;

[0016] The silicon rods continue to grow thicker until they reach a predetermined size. In this embodiment, the predetermined size of the silicon core is 10 mm, and the predetermined size of the silicon rod is 40 mm. At this stage, the temperature is controlled at about 600-900°C, and the pressure is from normal pressure to 1.0 MPa.

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Abstract

A polysilicon production process, comprising the following steps: a preliminary growth step of silicon rods: introducing hydrogen and dichlorodihydrosilicon into a reduction furnace to generate polysilicon on the surface of the silicon core to grow the silicon rods to a predetermined size; the complete growth step of the silicon rods: The mixed gas of trichlorosilane, dichlorodihydrosilane and hydrogen is introduced to complete the growth of the silicon rods; the step of opening the furnace: after the growth of the silicon rods is completed, the reduction furnace is opened, and the silicon rods are taken out. The polysilicon production process of the present invention adopts a two-stage growth method, starting with the reaction method of dichlorodihydrogen silicon and hydrogen gas, which has a faster growth rate than the conventional method of hydrogen reduction of trichlorosilicon. In the early stage of rod growth, the possibility of rod collapse is reduced. The polysilicon production process of the present invention can reduce the rod collapse rate and reduce production costs. In the complete growth stage of silicon rods, adding some dichlorodihydrosilane can effectively increase the silicon production rate and improve the conversion efficiency of raw materials by 10% to 15%.

Description

technical field [0001] The invention relates to a polysilicon production process, in particular to a polysilicon production process which uses a reduction process to produce polysilicon. Background technique [0002] In the existing production of polysilicon, polysilicon is generally obtained by reducing trichlorosilane in a reduction furnace. In the reduction furnace, trichlorosilane and hydrogen are introduced to grow crystals on silicon cores at high temperatures to form silicon rods. This is the most widely used method at present. One of the most widely used polysilicon production methods. However, the energy consumption of this production method is relatively high, and in the process of growing silicon rods, the phenomenon of "inverted rods" will occur, making it impossible to obtain complete polycrystalline silicon rods. Contents of the invention [0003] The technical problem to be solved by the present invention is to provide a polysilicon production process with ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B33/03
CPCC01B33/03C01P2006/90
Inventor 齐林喜郭金强
Owner 巴彦淖尔聚光硅业有限公司
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