An automatic cleaning device and method for a photolithography machine workpiece table
An automatic cleaning and workpiece table technology, which is applied to the cleaning method using tools, the cleaning method using gas flow, the cleaning method and the utensils, etc., can solve the problems of low cleaning and maintenance efficiency of the workpiece table, secondary pollution, etc. The possibility of pollution, the effect of reducing labor intensity, and reducing the hidden danger of damage to equipment
Active Publication Date: 2019-12-24
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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Problems solved by technology
[0004] The invention provides an automatic cleaning device and method for a workpiece table of a lithography machine to solve the problems of low cleaning and maintenance efficiency of the workpiece table and easy secondary pollution
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[0039] In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings. It should be noted that all the drawings of the present invention are in simplified form and use inaccurate scales, and are only used to facilitate and clearly assist the purpose of illustrating the embodiments of the present invention.
[0040] The lithography machine workpiece table automatic cleaning device provided by the present invention, such as figure 1 shown, including:
[0041] The table dust removal mechanism 100 is shrinkably installed on the lower surface of the main substrate 410, and is used to absorb dust and debris on the surface of the wafer holder 460;
[0042] The table cleaning mechanism 200 is shrinkably installed on the lower surface of the main substrate 410, and is used to contact the upper surface of the wafer ...
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The invention relates to a photoetching machine workpiece platform automatic cleaning device and method. The photoetching machine workpiece platform automatic cleaning device comprises a platform surface dust removal mechanism, a platform surface cleaning mechanism and guide rail dust removal mechanisms. The platform surface dust removal mechanism is installed on the lower surface of a main substrate in a contractible mode and used for absorbing dust and other things on the surface of a piece bearing platform. The platform surface cleaning mechanism is installed on the lower surface of the main substrate in a contractible mode and used for making contact with the upper surface of the piece bearing platform and coating anti-static fluid. The guide rail dust removal mechanisms are fixedly arranged on the two sides of a long-stroke movement module of a workpiece platform and correspond to air-bearing guide rails in position. By the adoption of the photoetching machine workpiece platform automatic cleaning device and method, the platform surface dust removal mechanism and the platform surface cleaning mechanism are fixedly arranged at the bottom of the main substrate, the piece bearing platform can actively get close to or make contact with the platform surface dust removal mechanism and the platform surface cleaning mechanism by the use of movement of the workpiece platform on the horizontal plane, and therefore maintenance of the piece bearing platform can be accomplished. Meanwhile, dust and other things on the air-bearing guide rails on the two sides are absorbed in a pumping mode by the use of the guide rail dust removal mechanisms, and therefore maintenance of the guide rails is achieved. The photoetching machine workpiece platform automatic cleaning device and method are high in cleaning efficiency and low in labor intensity of personnel and equipment damage hidden danger, and the reliability of equipment is greatly improved.
Description
technical field [0001] The invention relates to the field of lithography equipment, in particular to an automatic cleaning device and method for a workpiece table of a lithography machine. Background technique [0002] TFT (Thin Film Transistor, English full name: Thin Film Transistor) step-scan projection lithography machine is the key equipment in the optical projection lithography process of large-scale integrated circuit IC. Exposure quality and production efficiency are two important factors for the lithography machine. Performance indicators, in order to ensure that the lithography machine can achieve the performance indicators stably for a long time, so that the equipment can stably complete the function under the specified conditions and within the specified time, it is necessary to carry out daily maintenance work on the equipment, especially the daily maintenance of the workpiece table has a great impact on the exposure quality. extremely important influence. [0...
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IPC IPC(8): B08B5/04B08B3/00B08B1/02G03F7/20
CPCB08B1/02B08B3/00B08B5/04B08B5/043G03F7/70925
Inventor 黄静莉
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD