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Substrate processing equipment

A substrate processing device and technology for substrates, which are applied in the fields of circulating liquid processing, instruments, opto-mechanical equipment, etc., can solve the problems of difficult to cleanly maintain ambient gas and difficult to process substrates with excellent quality.

Active Publication Date: 2021-11-09
DAINIPPON SCREEN MTG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As a result, it is difficult to keep the ambient air in the cup cleanly, and it is difficult to process the substrate with excellent quality

Method used

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  • Substrate processing equipment
  • Substrate processing equipment
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Examples

Experimental program
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Embodiment Construction

[0055] Hereinafter, an embodiment of the present invention will be described with reference to the drawings.

[0056] figure 1 It is an overall structural view showing the schematic structure of the substrate processing apparatus of the embodiment, and is a longitudinal sectional view showing a state where the inner cup is located at the recovery position, figure 2 It is an overall configuration diagram showing a schematic configuration of a substrate processing apparatus according to an embodiment, and is a longitudinal sectional view showing a state where an inner cup is located at a retracted position. In addition, image 3 It is a partially enlarged longitudinal sectional view showing the state where the inner cup is located at the recovery position, Figure 4 It is a partially enlarged longitudinal cross-sectional view showing a state where the inner cup is located at the retracted position.

[0057] The substrate processing apparatus 1 of this embodiment is an apparat...

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Abstract

The present invention provides a substrate processing device for processing a substrate with a processing liquid, wherein the substrate processing device includes a substrate holding part, an outer cup, and an inner cup, the inner cup includes an inner cup main body and an inner cup discharge port, and the outer cup It includes an outer cup main body, an outer lower cup, a first liquid discharge port, a first exhaust port, a second liquid discharge port, a second exhaust port, and a separation partition wall, and the above-mentioned substrate processing device includes: a ring-shaped member capable of lifting ; a drive unit for lifting and lowering the ring-shaped member to move the inner cup main body between the recovery position and the retracted position.

Description

technical field [0001] The present invention relates to a substrate processing device, and more particularly to a technology for recovering a cup (Cup) of a processing liquid. The above substrate processing device is used for semiconductor wafers, liquid crystal display FED (Field Emission Display: Field Emission Display) substrates, optical display substrates, magnetic disk substrates, magneto-optical disk substrates, photomask substrates, and solar cell substrates (hereinafter simply referred to as substrates) are supplied with a treatment liquid. Background technique [0002] Conventionally, as such a device, there are devices including a substrate holder, a rotary drive mechanism, a first nozzle, a second nozzle, a cup, a first liquid discharge line, a second liquid discharge line, an exhaust line, and a movable A cup substrate processing apparatus (for example, refer to JP-A-2014-75575). [0003] The substrate holding unit holds the substrate in a horizontal posture. ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/67G03F7/30
CPCG03F7/3092H01L21/6715H01L21/67051G03F7/3021G03F7/322G03F7/325H01L21/6704H01L21/683H01L21/68764H01L21/67028H01L21/302H01L21/67057G03D3/06H01L21/67265G03F7/16
Inventor 株根孝太柏山真人高桥保夫西山耕二原山千穂
Owner DAINIPPON SCREEN MTG CO LTD
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