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Substrate treating apparatus

A substrate processing device and substrate technology, applied in circulation liquid processing, instruments, optomechanical equipment, etc., can solve the problems of difficult high-quality substrate processing, difficult to cleanly maintain ambient gas, etc.

Active Publication Date: 2018-02-02
DAINIPPON SCREEN MTG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As a result, it is difficult to keep the ambient air in the cup cleanly, and it is difficult to process the substrate with excellent quality

Method used

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Examples

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Embodiment Construction

[0055] Hereinafter, an embodiment of the present invention will be described with reference to the drawings.

[0056] figure 1 It is an overall structural view showing the schematic structure of the substrate processing apparatus of the embodiment, and is a longitudinal sectional view showing a state where the inner cup is located at the recovery position, figure 2 It is an overall configuration diagram showing a schematic configuration of a substrate processing apparatus according to an embodiment, and is a longitudinal sectional view showing a state where an inner cup is located at a retracted position. In addition, image 3 It is a partially enlarged longitudinal sectional view showing the state where the inner cup is located at the recovery position, Figure 4 It is a partially enlarged longitudinal cross-sectional view showing a state where the inner cup is located at the retracted position.

[0057] The substrate processing apparatus 1 of this embodiment is an apparat...

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Abstract

Disclosed is a substrate treating apparatus that treats a substrate with processing liquids. The apparatus includes a substrate holder, an exterior cup, and an interior cup. The interior cup includesan interior cup body, and an interior cup outlet. The exterior cup includes an exterior cup body, an exterior bottom cup, a first drain outlet, a first exhaust port, a second drain outlet, a second exhaust port, and a separation partition. The apparatus further includes an annular member movable upwardly / downwardly, and a drive unit that causes the annular member to move to shift the interior cupbody between a collecting position and a retracting position.

Description

technical field [0001] The present invention relates to a substrate processing device, and more particularly to a technology for recovering a cup (Cup) of a processing liquid. The above substrate processing device is used for semiconductor wafers, liquid crystal display FED (Field Emission Display: Field Emission Display) substrates, optical display substrates, magnetic disk substrates, magneto-optical disk substrates, photomask substrates, and solar cell substrates (hereinafter simply referred to as substrates) are supplied with a treatment liquid. Background technique [0002] Conventionally, as such a device, there are devices including a substrate holder, a rotary drive mechanism, a first nozzle, a second nozzle, a cup, a first liquid discharge line, a second liquid discharge line, an exhaust line, and a movable A cup substrate processing apparatus (for example, refer to JP-A-2014-75575). [0003] The substrate holding unit holds the substrate in a horizontal posture. ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67G03F7/30
CPCG03F7/3092H01L21/6715H01L21/67051G03F7/3021G03F7/322G03F7/325H01L21/6704H01L21/683H01L21/68764H01L21/67028H01L21/302H01L21/67057G03D3/06H01L21/67265G03F7/16
Inventor 株根孝太柏山真人高桥保夫西山耕二原山千穂
Owner DAINIPPON SCREEN MTG CO LTD
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