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Vapor deposition device

A technology of evaporation and evaporation materials, which is applied in the directions of vacuum evaporation plating, sputtering plating, ion implantation plating, etc., and can solve the problem of low yield of evaporation materials

Active Publication Date: 2018-03-27
AISIN SEIKI KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, in the case of using a wire heater, there is a problem that the yield of vapor deposition material is very low

Method used

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Examples

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Effect test

no. 1 approach

[0031] A vapor deposition device according to an embodiment of the present invention will be described with reference to the drawings. figure 1 It is a schematic cross-sectional view of the vertical vapor deposition apparatus 1 of the first embodiment viewed from a planar direction. in addition, figure 2 Yes figure 1 A-A cutaway view. figure 2 It is a schematic cross-sectional view of the vertical vapor deposition apparatus 1 of this embodiment seen from the side direction. also, figure 1 and figure 2 In , the left-right direction is defined as the front-rear direction, the right direction is defined as the front, and the left direction is defined as the rear. in addition, figure 1 In , the up-down direction is defined as the width direction. in addition, figure 2 The up and down direction of is the vertical direction (direction of gravity). The front-rear direction and the width direction are directions perpendicular to the vertical direction, that is, horizontal...

no. 2 approach

[0054] Next, a vapor deposition device according to a second embodiment will be described. The vapor deposition device according to the second embodiment is different from the above-mentioned first embodiment only in the arrangement and shape of the reflection plates, and the other configurations are the same as those of the above-mentioned first embodiment. Therefore, the arrangement and shape of the reflectors will be described below, and descriptions of other structures will be omitted.

[0055] Figure 8 It is a figure which shows the basket type heater 4 to which the reflecting plate 6B of 2nd Embodiment is attached, Figure 8 (a) is a front view viewed from the front, Figure 8 (b) is Figure 8 C-C sectional view of (a). Figure 8 In (b), the left-right direction is the front-back direction, the right side is the front, and the left side is the rear. like Figure 8As shown, the reflection plate 6B of the second embodiment has a back plate 61B and a connection portio...

no. 3 approach

[0060] Next, the vapor deposition device of the third embodiment will be described. The vapor deposition device of the third embodiment is the same as the vapor deposition device of the second embodiment, only the arrangement and shape of the reflection plate are different from the above-mentioned first embodiment, and the other structures are the same as those of the first embodiment. The above-mentioned first embodiment is the same. Therefore, the arrangement and shape of the reflector will be described, and the description of other structures will be omitted.

[0061] Figure 9 It is a figure which shows the basket type heater 4 to which the reflecting plate 6C of 3rd Embodiment is attached, Figure 9 (a) is a front view viewed from the front, Figure 9 (b) is Figure 9 D-D sectional view of (a). Figure 9 In (b), the left-right direction is the front-back direction, the right side is the front, and the left side is the rear. like Figure 9 As shown, the reflection pl...

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PUM

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Abstract

A vertical vapor deposition device according to the present invention is provided with: a retaining part for retaining a substrate; a basket-filament-type heater configured from a wire-shaped heatingelement for generating heat by application of electrical power thereto and having an accommodating part formed so as to be able to accommodate a vapor deposition material by bending of the wire-shapedheating element, the basket-filament-type heater being provided so that the accommodating part is positioned at a predetermined distance in a horizontal direction from the substrate retained in the retaining part; and a reflecting plate provided behind the vapor deposition material accommodated in the accommodating part as viewed from the substrate retained in the retaining part, and configured so that heat from the basket-filament-type heater is transmitted thereto.

Description

technical field [0001] The present invention relates to a vapor deposition device. Background technique [0002] A vapor deposition device for forming a thin film on a surface of a substrate includes a holding unit for holding the substrate, and a heater for heating a solid vapor deposition material. The vapor deposition material is heated by the heat of the heater, thereby generating vapor from the vapor deposition material. The generated vapor comes into contact with the substrate surface (deposition surface) held in the holding portion, and cools and solidifies at the contact portion. The fine solid particles solidified in this way are uniformly vapor-deposited on the vapor-deposition surface, thereby forming a thin film on the vapor-deposition surface. [0003] Patent Document 1 and Patent Document 2 disclose a vapor deposition device configured by arranging a reflecting plate so as to surround a space from a vapor deposition material to a base material and heating the...

Claims

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Application Information

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IPC IPC(8): C23C14/24
CPCC23C14/24C23C14/26C23C14/14C23C14/54C23C14/56
Inventor 水谷和挥片山幸祐
Owner AISIN SEIKI KK