Manufacturing method for flexible variable-angle array diffraction optical device made of photosensitive polyimide material
A photosensitive polyimide, diffractive optics technology, applied in optical elements, diffraction gratings, optics, etc., can solve the problems of inability to perform full-band speckle suppression, insufficient speckle suppression effect, and too many devices and types. , to achieve the effect of suitable for mass production, stable speckle suppression effect, and small size
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Embodiment 1
[0053] A flexible variable-angle array diffractive optical device for laser speckle suppression is fabricated on a photosensitive polyimide material and consists of three groups of one-dimensional binary diffractive optical structures connected end to end. The one-dimensional binary diffractive optical structure is an optical microstructure based on the M sequence (see attached figure 1 And attached figure 2 ), its one-dimensional binary diffractive optical structure pattern is represented by the parameter T, and the parameter T is the minimum unit width of the optical microstructure, and the width of all optical microstructures is represented by an integer multiple of T, and the one-dimensional binary The total width of the diffractive optical structure pattern is T 0 express. The depth of the one-dimensional binary diffractive optical structure is h, and the inclination angle between the one-dimensional binary diffractive optical structure and the X axis is θ 0 .
[005...
Embodiment 2
[0066]The depth h of the one-dimensional binary diffractive optical structure is 350 nanometers, and the thickness of the photosensitive polyimide photoresist coating in step 5 of the manufacturing process is 20 microns, and other implementation parameters and processes are the same as those in Example 1.
Embodiment 3
[0068] The depth h of the one-dimensional binary diffractive optical structure is 380 nanometers, and the thickness of the photosensitive polyimide photoresist coating in step 5 of the manufacturing process is 30 microns, and other implementation parameters and processes are the same as those in Example 1.
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