Cleaning technique of underlayer for PECVD film coating

A substrate and cleaning technology, which is applied in the field of PECVD coating substrate cleaning technology, can solve the problems of acetone toxicity, complicated troubles, and physical injuries, and achieve the effects of reducing troubles, reducing physical injuries of workers, and simple heat treatment

Inactive Publication Date: 2018-04-13
TONGWEI SOLAR (ANHUI) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, the public document "A Method for Cleaning a Glass Substrate for Coating" also has the following obvious defects: 1. The method uses ultrasonic cleaning, and ultrasonic cleaning equipment is required, which is very complicated and troublesome; 2. The method also uses Acetone is used to remove grease, but acetone is poisonous, and long-term exposure to acetone will cause harm to human body

Method used

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  • Cleaning technique of underlayer for PECVD film coating
  • Cleaning technique of underlayer for PECVD film coating
  • Cleaning technique of underlayer for PECVD film coating

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] Apply the cleaning process provided by the present invention to clean the coating substrate, and then perform coating on the substrate. The specific steps are as follows:

[0032] 1. First put the substrate for coating into the deionized water tank and soak for 2 minutes;

[0033] 2. Take out the soaked substrate from the deionized water, and then treat the substrate with the same heating temperature and the same heating time 5 times, each time use absorbent paper to completely wrap the substrate, and use Heat treatment in the oven, and the absorbent paper after each heating treatment needs to be removed and replaced with a new absorbent paper. The heating temperature of the heating treatment is 80°C, and the heating time of each heating treatment is 5 minutes;

[0034] 3. Take out the substrate after three times of heat treatment, and directly spray and rinse the substrate with ultrapure water, and spray each surface of the substrate for 30 seconds;

[0035] 4. Finall...

Embodiment 2

[0038] Apply the cleaning process provided by the present invention to clean the coating substrate, and then perform coating on the substrate. The specific steps are as follows:

[0039] 1. First put the substrate for coating into the deionized water tank and soak for 1min;

[0040] 2. Take out the soaked substrate from the deionized water, and then treat the substrate with the same heating temperature and the same heating time three times. Each time, use absorbent paper to completely wrap the substrate, and use The oven is used for heat treatment. After each heat treatment, the absorbent paper needs to be removed and replaced with a new one. The heating temperature of the heating treatment is 50°C, and the heating time of each heating treatment is 3 minutes;

[0041] 3. Take out the substrate after three times of heat treatment, and directly spray and rinse the substrate with ultrapure water, and spray each surface of the substrate for 30 seconds;

[0042] 4. Finally, the ni...

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Abstract

The invention discloses a cleaning technique of an underlayer for PECVD film coating. The cleaning technique comprises the following steps that 1, cleaning preparation is conducted, specifically, theunderlayer is placed into deionized water to be soaked for 1-2 min; 2, grease is adsorbed away, specifically, the underlayer soaked in the step 1 is taken out and repeatedly heated three to five times, and the heating treatment comprises the steps that the underlayer is completely wrapped with absorbent paper and then heated and the absorbent paper is taken down after heating is completed; 3, cleaning is conducted after the grease is removed, specifically, the underlayer obtained after the step 2 is finished is sprayed through ultrapure water; and 4, drying is conducted through hot air, specifically, the underlayer sprayed in the step 3 is hot-dried through nitrogen with the temperature being 30-50 DEG C. According to the cleaning technique, in the overall process, ultrasonic cleaning on the underlayer is omitted, using of an ultrasonic cleaning instrument is avoided, the trouble of the cleaning process is reduced, the grease can be better adsorbed away through the absorbent paper, using of acetone is further avoided, harm to worker bodies is well relieved, and the very effective effect is achieved.

Description

technical field [0001] The invention relates to the technical field of PECVD coating technology, in particular to a substrate cleaning process for PECVD coating. Background technique [0002] The quality of PECVD coating film involves many aspects such as structure, physicochemical and function. On transparent substrates such as glass, pinholes and adhesion are issues of concern for large-area deposited films by vacuum sputtering, and they are also relatively common film quality problems. In industrial production, glass for coating The original sheet is generally ordinary flat glass produced by the float method. During its production, transportation, and storage, it may always accumulate dirt such as dust, carbon particles, grease, microorganisms, and certain impurity ions in the atmosphere. Dirt will affect the quality of coated glass, and in severe cases will lead to defective products. Therefore, to eliminate and reduce pinholes and improve the bonding force of the film...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/04B08B3/02B08B7/00F26B21/00
CPCB08B3/02B08B3/04B08B7/0071F26B21/00
Inventor 徐峰谢毅陈刚谭飞徐光
Owner TONGWEI SOLAR (ANHUI) CO LTD
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