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Method for improving pipe type PECVD technological yield and application of method

A process and tubular technology, applied in the field of crystalline silicon cells in the photovoltaic industry, can solve problems such as product appearance or reliability impact, achieve the effect of shortening process running time and realizing production capacity

Inactive Publication Date: 2018-05-18
선테크파워컴퍼니리미티드
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, various manufacturers of traditional technical means have studied thoroughly. In-depth optimization may have a certain impact on product appearance or reliability, and there are certain risks.

Method used

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  • Method for improving pipe type PECVD technological yield and application of method
  • Method for improving pipe type PECVD technological yield and application of method

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Embodiment Construction

[0019] In order to describe the technical content of the present invention more clearly, further description will be given below in conjunction with specific embodiments.

[0020] The present invention provides a method for increasing the production capacity of the tube-type PECVD process. The method includes: vacuumizing after coating and controlling the temperature of the system so that the furnace tube remains in a continuous heating state.

[0021] In one embodiment provided by the present invention, the method includes: vacuuming after coating and setting the temperature of the system between 450°C and 500°C, so that the furnace tube remains in a continuous heating state; the tubular PECVD The coating process temperature in the process is controlled at 445°C to 455°C.

[0022] In another embodiment provided by the present invention, the method includes: vacuuming after coating and setting the temperature of the system to 500°C, so that the furnace tube remains in a contin...

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Abstract

The invention relates to a method for improving the pipe type PECVD technological yield. The method comprises the steps that vacuumizing is carried out after film coating, the system temperature is controlled, and a furnace pipe keeps in the continuous heating state. The invention further relates to application of the method for improving the pipe type PECVD technological yield. By adopting the method for improving the pipe type PECVD technological yield, a traditional process technology is abandoned, the process running time is shortened by means of a non-coating technological process (an auxiliary process after film coating), and the yield improving is achieved; and the actual process running initial temperature can be improved to 30 DEG C, and 3 min can be saved in the heating step (before-adjustment temperature rising wasted time is 8 min-10 min, and the after adjustment temperature rising wasted time is 5 min-7 min)

Description

technical field [0001] The invention relates to the field of crystalline silicon cells in the photovoltaic industry, and specifically refers to a method for increasing the production capacity of a tubular PECVD process. Background technique [0002] With the increasing awareness of environmental protection and the emphasis on clean energy, the entire photovoltaic industry is showing a trend of vigorous development. Under this good opportunity, for crystalline silicon cell manufacturing enterprises, if they can pursue the maximum output, not only can the enterprise obtain greater profits, but also can greatly reduce the manufacturing cost. [0003] In the entire conventional battery process production process, when the number of equipment is 1:1, the overall production capacity of the front-end process etching and the back-end process screen is higher than that of the PECVD process, resulting in the output of the PECVD process has always been a bottleneck. Although the purch...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/52C23C16/513
CPCC23C16/52C23C16/513
Inventor 王斌何悦周东王在发任勇
Owner 선테크파워컴퍼니리미티드