Mask, preparation method of mask and photoetching method
A mask and mask pattern technology, applied in the field of photomasks, can solve the problems of long production cycle of display substrates, insufficient use of quartz substrate space, and high production costs of display substrates
Active Publication Date: 2018-05-18
BOE TECH GRP CO LTD +1
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Problems solved by technology
[0002] When making the display substrate, photomask technology is often used to make the patterned film layer contained in the display substrate, which makes it necessary to use a large number of masks to realize the photomask when making the display substrate, making the manufacturing cost of the display substrate relatively high
[0003] At present, a common mask uses a quartz substrate as a base, and a chromium film is made on the quartz substrate according to a mask pattern to form a mask; however, this mask can only produce a patterned film layer, which is not sufficient. Utilizing the space of the quartz substrate, before making the display substrate, it is necessary to complete the production of the mask plate corresponding to each pattern according to the pattern of the display substrate film layer before starting the display substrate production, resulting in a longer production cycle of the display substrate
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[0035] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
[0036] see figure 1 The mask plate 1 provided by the embodiment of the present invention includes a light-transmitting substrate 10, and the light-transmitting substrate 10 includes opposite first surfaces and second surfaces; the light-transmitting substrate 10 is generally a quartz substrate (quartz glass), or other material substrates, A detailed description will not be given here.
[0037] In the embodiment of the present invention, both the first surface and ...
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The invention discloses a mask, a preparation method of the mask and a photoetching method, and relates to the technical field of photomasks so as to reduce the manufacturing cost of a display substrate by achieving photoetching of two patterns through the single mask. The mask comprises a light-transmitting substrate, wherein the light-transmitting substrate comprises a first surface and a secondsurface which are opposite to each other; one-way light-transmitting pattern layers are formed on the first surface and on the second surface respectively, the pattern of the one-way light-transmitting pattern layer formed by the first surface and the pattern of the one-way light-transmitting pattern layer formed by the second surface are different, and the transmission direction of light transmitted by the one-way light-transmitting pattern layer of the first surface is opposite to the transmission direction of light transmitted by the one-way light-transmitting pattern layer of the second surface. The preparation method of the mask is used for preparing the mask. According to the mask, the preparation method of the mask and the photoetching method are used for manufacturing a display panel through the photomasks.
Description
technical field [0001] The invention relates to the technical field of photomasks, in particular to a mask plate, a preparation method thereof, and a photolithography method. Background technique [0002] When making the display substrate, photomask technology is often used to make the patterned film layer contained in the display substrate, which makes it necessary to use a large number of masks to realize the photomask when making the display substrate, making the manufacturing cost of the display substrate relatively high . [0003] At present, a common mask uses a quartz substrate as a base, and a chromium film is made on the quartz substrate according to a mask pattern to form a mask; however, this mask can only produce a patterned film layer, which is not sufficient. Using the space of the quartz substrate, before making the display substrate, it is necessary to complete the production of the mask plate corresponding to each pattern according to the pattern of the dis...
Claims
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Login to View More IPC IPC(8): G03F1/76G03F7/20
CPCG03F1/76G03F7/70216
Inventor 俞洋刘晓伟吴洪江陈凡李海光廖加敏罗时建伍蓉
Owner BOE TECH GRP CO LTD