Fabric capable of achieving ultraviolet protection

An anti-ultraviolet and ultraviolet technology, applied in the field of textiles, can solve problems such as uneven dispersion, complicated process steps, and strong toxicity, and achieve the effects of reduced demand, good wearing experience, and high softness

Inactive Publication Date: 2018-06-01
GUANGDONG XINFENG TECH
View PDF0 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] However, organic ultraviolet absorbers are mainly aromatic organic compounds, which are highly toxic, cause serious pollution to the environment, and are extremely harmful to the human body.
In order to deal with the inorganic UV shielding agent coating on textiles, adhesives are needed to solve the problem of poor affinity with organic textile raw materials, and at the same time, the dispersion is uneven and easy to agglomerate

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Fabric capable of achieving ultraviolet protection
  • Fabric capable of achieving ultraviolet protection

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] Such as figure 1 Shown, a kind of preparation method that can realize the fabric of anti-ultraviolet, it comprises:

[0034] The base fabric is cotton, and the base fabric is pre-treated to remove surface stains;

[0035] The base cloth is rolled into the unwinding chamber, and the vacuum degree of the unwinding chamber is kept at 1-1.5E -1 Pa interval;

[0036] The base cloth enters the heating chamber, so that the temperature of the base cloth rises to 75°C, and the vacuum degree of the heating chamber is kept at 1-1.5E -1 Pa;

[0037] The base cloth enters the pre-vacuum chamber, and the vacuum degree in the chamber is kept at 5E -2 Pa;

[0038] When the vacuum degree of the coating chamber reaches 1E -3 When the Pa is above, the base cloth enters the coating chamber, and the vacuum deposition method is used to form an ultraviolet reflection layer on the base cloth, and the target material is TiO 2 Target, magnetron sputtering power is 1800W;

[0039] The bas...

Embodiment 2

[0043] Such as figure 1 Shown, a kind of preparation method that can realize the fabric of anti-ultraviolet, it comprises:

[0044] The base fabric is cotton, and the base fabric is pre-treated to remove surface stains;

[0045] The base cloth is rolled into the unwinding chamber, and the vacuum degree of the unwinding chamber is kept at 2E -1 Pa interval;

[0046] The base cloth enters the heating chamber, so that the temperature of the base cloth rises to 58°C, and the vacuum degree of the heating chamber is kept at 2E -1 Pa interval

[0047] The base cloth enters the pre-vacuum chamber, and the vacuum degree in the chamber is kept at 3E -2 Pa interval;

[0048] When the vacuum degree of the coating chamber reaches 1E -3 When the Pa is above, the base cloth enters the coating chamber, and the ultraviolet reflection layer is formed on the base cloth by vacuum deposition method. The target materials are Ti and Ag respectively, and the sputtering power is 2500W and 3000W ...

Embodiment 3

[0053] Such as figure 1 Shown, a kind of preparation method that can realize the fabric of anti-ultraviolet, it comprises:

[0054] The base fabric is polyester, and the base fabric is pre-treated to remove surface stains;

[0055] The base cloth is rolled into the unwinding chamber, and the vacuum degree of the unwinding chamber is kept at 0.7E -1 Pa interval;

[0056] The base cloth enters the heating chamber, so that the temperature of the base cloth rises to 89°C, and the vacuum degree of the heating chamber is kept at 0.7E -1 Pa interval

[0057] The base cloth enters the pre-vacuum chamber, and the vacuum degree in the chamber is kept at 8E -2 Pa interval;

[0058] When the vacuum degree of the coating chamber reaches 1E -3 When Pa is above, the base cloth enters the coating chamber, and the ultraviolet reflection layer is formed on the base cloth by vacuum deposition method. The target materials are Zn, TiN, Ag, respectively, and the magnetron sputtering power is ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a fabric capable of achieving ultraviolet protection. The fabric comprises a base cloth and an ultraviolet reflective layer, and the ultraviolet reflective layer is formed by adopting a vacuum deposition technology; and target materials comprise one or several elements of Ti, Fe, Al, Zn, Cu, W, Mg, Au, Ag, Cr, Ni, V, Co, C, N, O, Si and Pt. The product adopts the vacuum deposition technology, the surface of the fabric can be made to form the ultraviolet reflective layer, the ultraviolet reflective layer has the very high reflection and scattering abilities on ultraviolet rays, and therefore, and thus the ultraviolet protection function of the fabric is improved.

Description

technical field [0001] The invention belongs to the field of textiles, in particular to a fabric capable of realizing ultraviolet protection. Background technique [0002] With the development of science and technology and the improvement of the quality of life, people's demand for the function of textiles continues to rise. In addition to the basic requirements of comfort, health and safety, UV protection has gradually become one of the hot demands of fabrics. [0003] According to different wavelengths, ultraviolet rays can be divided into three categories: UVC (wavelength 200-280nm), UVB (wavelength 280-320nm) and UVA (wavelength 315-340nm). Among them, UVA can directly penetrate to the dermis of the skin, destroying collagen and elastin, causing skin relaxation and wrinkles. The UVB energy is very strong, which can easily cause solar dermatitis caused by ultraviolet allergies, and lead to the formation of melanin, causing pigmentation, dullness, skin photoaging, roughne...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C23C14/20D06M11/83D06M11/46D06M101/06D06M101/32
CPCC23C14/20D06M11/46D06M11/83D06M2101/06D06M2101/32D06M2200/25
Inventor 王银川余荣沾刘琼溪张欣尹华平梁媛
Owner GUANGDONG XINFENG TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products