Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A cosmetic mask

A technology for facial masks and film-forming polymers, applied in cosmetics, skin care preparations, cosmetic preparations, etc., which can solve the problems of undisclosed creative combinations

Active Publication Date: 2018-06-08
UNILEVER IP HLDG BV
View PDF7 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] The above patent publications do not disclose the inventive combination of the present invention, namely specific film-forming polymers and whitening particles incorporated into a water-insoluble matrix for topical application to produce the desired effect

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1-4

[0032] Examples 1-4: Including TiO in the facial mask 2 and the effect of film-forming polymers

[0033] Make-up masks were prepared as follows.

[0034] A water-insoluble porous substrate (in this case a non-woven fabric) is dipped into 20ml of emulsion and the mask is sealed in an individual package.

[0035] The face masks were impregnated with the following compositions as shown in Table 1 below. Evaluation of the skin lightening effect of cosmetic masks. The procedure used is to apply the mask, wash the surface and measure the effect as follows:

[0036] plan 1:

[0037] Spread the non-woven fabric with the impregnated emulsion on a 50# bioskin panel (50#BSP) for 15 minutes. The nonwoven was then peeled off and the 50# BSP was rinsed with tap water for 15 seconds. After 50#BSP is completely dry, measure the L* value. From (L 样品 -L 空白 ) to obtain ΔL. L 样品 It is the L value of 50#BSP of the facial mask after cleaning, L 空白 is the L value of blank 50#BSP.

[003...

Embodiment 5-8

[0043] Examples 5-8: Samples are similar to Examples 1-4, except that different cleaning schemes are used

[0044] Samples were taken as in Examples 1-4 and applied to the desired surface, but with the cleaning procedure modified as follows:

[0045] Scenario 2:

[0046] Spread the non-woven fabric with the emulsion on a 50# bioskin panel (50#BSP) for 15 minutes. The nonwoven was then peeled off and the 50#BSP was dried at room temperature (25°C) for 1 hour. After that, the 50#BSP was rinsed with tap water for 15 seconds, and the L* value was measured after it was completely dried. From (L 样品 -L 空白 ) to obtain ΔL. L 样品 It is the L value of 50#BSP of the facial mask after cleaning, L 空白 is the L value of blank 50#BSP.

[0047] The skin lightening data is summarized in Table-2 below:

[0048] Table 2

[0049] Element

[0050] The data in Table-1 and 2 show that when the combination of whitening particles (titanium dioxide) and film-forming polymer is incorpor...

Embodiment 9-13

[0051] Examples 9-13: Effect of using another kind of whitening particles (hollow polymer microspheres)

[0052] A cosmetic mask having the ingredients shown in Table-3 was prepared and applied similarly to the previous examples. The face was washed using Protocol 1, and the skin lightening effect (measured in ΔL) is summarized in Table-3.

[0053] table 3

[0054] Element

[0055] Sunspheres: It is a hollow microsphere polymer with an average particle size of 400nm made of styrene / acrylate copolymer from Dow Chemical.

[0056] Protocol 2 was performed according to the samples in Table-3 and the ΔL values ​​are summarized in Table-4.

[0057] Table 4

[0058] Element

[0059] The data in Table-3 and 4 show that when the combination of whitening particles (hollow polymer microspheres) and film-forming polymers are incorporated into a water-insoluble matrix and applied to the skin, very different cleansing regimes can be used To obtain high skin brighteni...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
particle diameteraaaaaaaaaa
particle diameteraaaaaaaaaa
particle diameteraaaaaaaaaa
Login to View More

Abstract

The invention relates to a cosmetic mask, particularly to a cosmetic mask that is a water insoluble substrate with a composition impregnated therein which can be applied to the face or any other topical surface of the body for providing instant lightening benefits without the disadvantages of unnatural whiteness. The instant lightening benefits are achieved through use of a judicious combination of whitening particles and film forming polymers impregnated in the substrate.

Description

technical field [0001] The invention relates to a beauty mask. The present invention more particularly relates to a cosmetic mask, which is a water-insoluble matrix impregnated with a composition, which can be applied to the face or any other topical surface of the body to provide an immediate skin lightening effect without the usual The downside of unnatural whiteness associated with this instant skin lightening product. Background technique [0002] Skin brightening is one of the most sought after cosmetic effects recently. Exposure of the skin to sunlight and other environmental irritants darkens it, often in an uneven and blotchy manner. So, not only people who live near tropical areas naturally have darker skin, but also those who live further away from tropical areas suffer from such an unattractive appearance. There are many cosmetic methods to deal with this problem. [0003] One approach is to use foundation and makeup compositions (also known as make-up) with h...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/29A61K8/81A61Q19/02A61K8/02
CPCA61K8/0212A61K8/29A61K8/8147A61Q19/02
Inventor 敖明祺A·H·埃卡尼恩科多N·D·加特利亚李航昇C·原
Owner UNILEVER IP HLDG BV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com