Method for manufacturing metal wire gate polarizer
A metal wire grid and polarizer technology, used in optics, optical elements, polarizing elements, etc., can solve the problem of high aspect ratio requirements of imprint templates, achieve the effect of reducing aspect ratio requirements and improving manufacturing efficiency
Inactive Publication Date: 2018-06-15
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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[0007] An exemplary embodiment of the present invention is to provide a method for manufacturing a metal wire grid polarizer, so as to overcome the problem in the prior art that the aspect ratio of the imprint template is high
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[0025] Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like numerals refer to like parts throughout. The embodiments are described below in order to explain the present invention by referring to the figures.
[0026] Figure 7 A flowchart illustrating a method of manufacturing a metal wire grid polarizer according to an exemplary embodiment of the present invention. Figure 8 to Figure 14 A schematic diagram showing a method of manufacturing a metal wire grid polarizer according to an exemplary embodiment of the present invention. Figure 15 A schematic diagram showing an electrodeposition apparatus for manufacturing a metal layer in a metal wire grid polarizer according to an exemplary embodiment of the present invention. Figure 16 A schematic diagram showing a deposition process for manufacturing a metal layer in a metal wire grid polarizer according to an exemplary embod...
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Abstract
The invention provides a method for manufacturing a metal wire gate polarizer. The method comprises the steps that a conductive layer, a first photoresist layer, an inorganic layer and a second photoresist layer are formed on a substrate in turn; first photoresist patterns are formed through stamping; inorganic layer patterns are formed; second photoresist patterns are formed; a metal layer is formed; and multiple stripped inorganic layers and multiple stripped second photoresist film layers are removed so as to obtain the metal wire gate polarizer, wherein the inorganic layer is formed by thematerial of which the removal conditions are different from those of the first photoresist layer and the second photoresist layer. According to the method for manufacturing the metal wire gate polarizer, the wire gate width is not influenced by the stamping template so that the requirement for the depth ratio of the stamping template can be reduced.
Description
technical field [0001] The invention relates to the technical field of metal wire grids, and more specifically, relates to a method for manufacturing a metal wire grid polarizer. Background technique [0002] The sub-wavelength metal wire grid polarizer can transmit the incident light whose electric field direction is perpendicular to the wire grid direction, and reflect the light whose electric field direction is parallel to the wire grid direction. Reflected light is reused, and the ability of metal wire grid polarizers to transmit incident light is far greater than that of traditional polarizers. Its transmittance can reach more than 90%, and the contrast ratio is as high as 10,000:1. In addition, since metal wire grid polarizers can achieve excellent durability in high-temperature or high-humidity environments, metal wire grid polarizers have incomparable advantages in fields that require high reliability such as outdoors. [0003] Generally, the polarization characteri...
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IPC IPC(8): G02B5/30G03F7/00
CPCG02B5/3058G03F7/0002G03F7/0005G03F7/0017
Inventor 侯俊
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD