Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A kind of soothing and repairing nourishing mask essence and its preparation method

A facial mask and essence technology, which is applied in the field of skin care products, can solve the problems of allergies, dryness and discomfort of the face, and achieve the effect of enhancing skin elasticity, reducing wrinkles and fine lines, and soothing and anti-allergic skin

Active Publication Date: 2019-01-01
广东德丝肤生物科技有限公司
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In view of the above-mentioned deficiencies in the prior art, the object of the present invention is to provide a soothing and nourishing facial mask essence and a preparation method thereof. The soothing and nourishing facial mask essence is safe and gentle, and aims to solve the problem of facial dryness and discomfort caused by long-term use of the existing facial mask essence. and allergy issues

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of soothing and repairing nourishing mask essence and its preparation method
  • A kind of soothing and repairing nourishing mask essence and its preparation method
  • A kind of soothing and repairing nourishing mask essence and its preparation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0110] Take by weighing each raw material corresponding to embodiment 1-4 according to table 1 data, prepare according to the following steps:

[0111] 1) Add water and base material components into the reaction kettle, stir and disperse, heat to 80-85 degrees, keep warm and stir for 15-30 minutes, and start to cool down after the solid phase is completely dissolved and dispersed;

[0112] 2) When the temperature drops to 50 degrees, add the soothing and repairing components, and continue stirring to disperse evenly;

[0113] 3) Add antibacterial and antiseptic components when the temperature drops to 45 degrees, and stir to disperse evenly;

[0114] 4) When the temperature drops to 43 degrees, add the aromatic component, stir for 10-20 minutes to make it evenly dispersed, and continue to cool down;

[0115] 5) Mix the pH regulator with a small amount of water evenly, add the pH regulator component when the temperature drops to 40 degrees, stir for 10-20 minutes to make it ev...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses mask essence with soothing, repairing and nourishing effects and a preparation method thereof. The mask essence with the soothing, repairing and nourishing effects is preparedfrom, by weight, 3.47-10.72% of base stock component, 1.1-11.5% of soothing and repairing component, 2-4.9% of anti-bacterial and anti-corrosion component, 0.35-1.4% of aroma component, a proper amount of PH adjuster and the balance water. By means of the mask essence with the soothing, repairing and nourishing effects, face skin allergies can be effectively nourished and soothed, the uncomfortable current situation caused by abuse of hormone cosmetics of skin is solved, rich repairing nutrition components are provided for the face skin, deep moisturizing is achieved, damaged skin is nourishedand repaired, the anti-allergy skin is soothed, wrinkles and micro-grooves are reduced, the elasticity of the skin is enhanced, and the skin is smooth, soft and well-moisturized and full of vigor.

Description

technical field [0001] The invention relates to the field of skin care products, and mainly relates to a soothing, repairing and nourishing facial mask essence and a preparation method thereof. Background technique [0002] With the continuous improvement of people's living standards, the pursuit of beauty is getting higher and higher, especially the mild and safe facial mask cosmetics are more and more eager, but air pollution, ultraviolet rays, environmental allergens invasion, unsafe facial masks and cosmetics use, And other factors increase the damage to human skin, and after a long time, it will lead to dryness, discomfort and allergies on the face. However, most of the mask products currently on the market are made in the form of essence, and some ingredients are irritating to the skin and have safety risks: such as solubilizers (PEG-60 hydrogenated castor oil, polysorbate-20), preservatives (hydroxyl Benzyl ester, propyl paraben, methylisothiazolinone, phenoxyethanol...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): A61K8/67A61K8/9789A61K8/98A61K8/36A61K8/34A61K8/42A61K8/73A61K8/92A61Q19/00A61Q19/08
CPCA61K8/345A61K8/36A61K8/42A61K8/673A61K8/73A61K8/731A61K8/732A61K8/735A61K8/922A61K8/97A61K8/988A61Q19/00A61Q19/08
Inventor 王秀清
Owner 广东德丝肤生物科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com